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Deposition
DepositionInstrumentation

TriQ

By Quorum Technologies Ltd

High Throughput Thin Film Deposition System The TriQ is an automated and versatile large chamber triple head sputter coater offering unparalleled ease of use and flexibility based on your application needs. Recommended for controlled thin film deposition for electron microscopy sample preparation and material fabrication. Product features - Turbomolecular pumped system with ultimate vacuum of 1x10⁻⁶ mbar, enabling high quality coatings - Triple head design offering even deposition of thin film coatings across samples up to 8” in diameter - Optimised planetary stages for deposition across 6” and 8” diameter samples - Integrated Film Thickness Monitor (FTM) to control deposition of coating - Intuitive and responsive touchscreen colour panel design - Multi-colour LED visual status indicator offering process updates - Pre-set recipes for standard protocols resulting in sample reproducibility - Customisable recipes enabling users to tailor process parameters to their specific requirements - Compatible with a range of target materials Typical applications Electron Microscopy - High resolution imaging for detailed surface and structural analysis - Enhanced surface conductivity for improved imaging performance - Uniform fine-grained coatings for superior sample preparation - Reduced charging effects and improved analytical accuracy Materials Research - Precision thin film deposition for advanced applications - Controlled materials fabrication with consistent results - Capability to process large-area substrates efficiently - Support for research, development, and prototype production Advanced Materials - Novel batteries and fuel cells - Development and study of quantum materials - Semiconductor materials for electronics and microdevices - Photonic materials for optical and communication systems Specifications Instrument Specifications - Unit weight: 52 Kg - Packed weight: 64 Kg(appoximatly) - Instrument size: 440 mm (W) x 562 mm (H) x 551 mm (D) - Instrument size with chamber open: 440 mm (W) x 912 mm (H) x 551 mm (D) - Chamber size: 300 mm Ø diameter, 220 mm (H) - Specimen stage: 80 mm (H) from chamber base (standard stage required for sputtering tall samples), 150 mm and 200mm Ø diameter substrate. - 145mm (H) from chamber base (extended stage required for sputtering short samples), 150 mm and 200mm Ø diameter substrate. Performance - Ultimate vacuum: 1x10⁻⁶ mbar or lower - Operational vacuum: 5x10⁻⁶ mbar - Vacuum gauge range: 1000 mbar to 6.7x10⁻⁹ mbar - User interface: Touch screen colour display Power Supply - Supply Voltage: 100-240 V, 50-60 Hz - Power Consumption(Incl. rotary pump): 1500 VA Deposition - Deposition Current: 1-150 mA - Deposition Rate: 0.1-20 nm/min (e.g. for gold) - Sputter Timer: 0-60 min - Sputter Target: Target Disc style, 57 mm Ø diameter x 0.3 mm thickness(chromium supplied as standard) Film Thickness Monitor (FTM) - Quartz crystal: Gold,12 mm Ø diameter, 5 MHz RC Quartz Crystals - Thickness range:1-2000 nm - Tooling factor range: 0.1-10

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