By Impedans Ltd
The Langmuir Probe is one of the most widely used plasma measurement instruments. It is used to measure the characteristics of the bulk plasma region. The Impedans Langmuir Probe System measures the key plasma parameters such as plasma potential, charged particle density (electron & ion) and the electron temperature using the most advanced theoretical models available. Langmuir probe measurements provide the user with fundamental insights into the physical phenomena that govern plasma behaviour. With an 80 MS/s sampling rate, pulse profiling and single shot plasmas can be measured with unrivaled time resolution. Measure Key Plasma Parameters Live - Measure the key plasma parameters such as electron temperature, ion density, plasma potential and electron energy distribution function. Easy Installation - Our Langmuir Probe systems are modular and can be quickly and easily installed on chambers with various flange options. Our probes are also compatible with almost all chamber types. Intuitive Software - Our software, which can be installed on any PC or laptop, is very intuitive and user friendly. Spatial Measurements - All of the products in our Langmuir range come with an optional linear drive. This can be used to automatically scan across the wafer and spatially characterize your plasma. Multiple Probe Head Options with Replaceable Tips - All of our langmuir systems come with options for single probe, double probe, planar, spherical and mach probe heads where the heads can be interchanged and the tips can be easily replaced. 100's of Publications - Our Langmuir probe Systems have been used in 100's of publications and are accepted withing the community as a reliable data source. Multiple Probe Models - We have multiple models including fixed shaft and flexible shaft versions which allow for easy installation in all scenarios. RF Filters - Our Langmuir Probe systems come with inbuilt RF filters which allow ensure the accuracy of the data. Automatic Tip Cleaning - Our Langmuir Probe systems come with the ability to clean automatically in the plasma using ion bombardment. Our Langmuir systems are very easy to install in any plasma chamber. The system is small enough to be easily portable meaning a single system can be used in multiple chambers. It has a main electronics unit and a probe with vacuum feedthrough. The probe comes with a CF40 flange but we can also provide adapters to alternative flanges as needed. Our software has been designed to be easy to use and can be installed on any laptop or PC. Once installed the software allows the user to configure the system, run the scan, visualize the data and import/export data as needed. The system will automatically apply the complex langmuir probe algorithms to present the calculated parameters. The user also has the option to chose between several algorithms. Our systems come with an optional linear drive which allows you to scan spatially across your plasma. The software communicates with the linear drive allowing you to control the positioning and plot the data within the software saving you time and effort when analyzing your data. The linear drives come with bellows support, a full cover and manual readouts. All of our langmuir probes come with replaceable tips meaning they can easily be replaced when maintenance is required. We have several tip and material options to choose from to best suit your application. Our Langmuir Probes have been used in many publications across the world. They have been accepted by the community as a go to source of plasma data that is trusted and reliable. This means you can rest assured that your data is accurate, reliable and will not be questioned, giving your research more credibility and a higher acceptance rate. Available Models Electronics Unit: Part Number 02-0241-01 - Langmuir Probe | Electronics Unit | Current Range 1.5uA – 1A Part Number 02-0045-01 - Langmuir Probe | Electronics Unit | Current Range 15nA – 150mA Part Number 02-0460-01 - Langmuir Probe | Electronics Unit | Current Range 1.5nA – 15mA
With the Impedans Octiv unit, we have revolutionized the impedance characterization process, making it more efficient and user-friendly than ever before. Our state-of-the-art technology provides real-time impedance readings, allowing you to move the match unit’s load and tune motors seamlessly through their full range while capturing data on the fly. The Impedans Octiv unit allows you to export all your captured data easily in CSV format. This streamlines your documentation and analysis, making it a breeze to interpret and share your characterization results. Best for: RF Calibration, RF Parameters, Live Process Monitoring, Fault Detection & Classification. Measures: RF Voltage, Current, Phase, Power and Impedance of the fundamental and harmonic frequencies. Also measures RF waveform and ion flux.
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Our systems come with an optional linear drive which allows you to scan spatially across your plasma. The software communicates with the linear drive allowing you to control the positioning and plot the data within the software saving you time and effort when analyzing your data. The linear drives come with bellows support, a full cover and manual readouts. Our linear drives also come with a CF40 flange but adapters can be provided. This can be used to automatically scan across the wafer and spatially characterize your plasma.
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All of our langmuir probes come with replaceable tips meaning they can easily be replaced when maintenance is required. We have several tip and material options to choose from to best suit your application. All of our langmuir systems come with options for single probe, double probe, planar, spherical and mach probe heads where the heads can be interchanged and the tips can be easily replaced. Information on Multiple Tip Styles Available Upon Request
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The Quantum system is comprised of a retarding field energy analyser with integrated quartz crystal microbalance (QCM), used to measure the ion energy distribution (IED) and the ion-neutral deposition ratio at a surface inside a plasma reactor. This system measures and displays deposition rates, IED, ion flux and the DC bias voltage at the surface on which the sensor is deployed. Using crystals coated with specified materials, the system can also measure etch rates of ions and neutrals. The system was designed to be mounted on electrically biased surfaces including radio-frequency (RF). A unique shielding structure allows accurate detection of the millivolt level, 6 MHz, crystal oscillation frequency in the presence of RF bias levels up to 900 V peak-to-peak. Unlike other QCM systems, no water cooling of the crystals is needed. A compensation crystal, mounted next to the measurement crystal, is not exposed to plasma particles and used to compensate for temperature effects on the oscillating frequency of the measurement Measure Key Process Performance Parameters Live: Measure the key parameters of process performance; ion flux, ion energy distribution function, deposition rate and ion-neutral ratio. Measure Deposition Rate: The quantum system has an embedded quartz crystal microbalance that allows deposition rate to be monitored. Easy Installation: Our Langmuir probe systems are modular and can be quickly and easily installed on chambers with various flange options. Intuitive Software: Our software, which can be installed on any PC or laptop, is very intuitive and user friendly. Substrate Options: Our RFEA sensors come with multiple substrate shapes and materials. Replaceable Sensing Elements: All of our systems come with replaceable sensing elements (button probes) which can be easily replaced when maintenance is needed. Measure the key parameters of process performance; ion flux, ion energy distribution function, deposition rate and aspect ratio. Measure the parameters in real time, allowing you to make changes and monitor the effects live, saving hours of unnecessary setup and waiting. The Quantum system is comprised of a retarding field energy analyzer with integrated quartz crystal microbalance (QCM), used to measure the ion energy distribution (IED) and the ion-neutral deposition ratio at a surface inside a plasma reactor. This system measures and displays deposition rates, IED, ion flux and the DC bias voltage at the surface on which the sensor is deployed. The Quantum provides insight for fundamental research and for plasma model validation. Our RFEA systems are very easy to install in any plasma chamber. The system is small enough to be easily portable meaning a single system can be used in multiple chambers. It has an electrical feedthrough, a detachable holder substrate and replaceable sensors. the electrical feedthrough comes with a CF40 flange but we can also provide adapters to alternative flanges as needed. Our software has been designed to be easy to use and can be installed on any laptop or PC. Once installed the software allows the user to configure the system, run the scan, visualize the data and import/export data as needed. The system will automatically calculate the IEDF results and in the case of a multi sensor Semion system the software will generate contour maps of energy and flux uniformity over the wafer area. The sensing elements and holder substrates are available in anodised aluminium, bare aluminium or stainless-steel options. We also have holder substrate options with up to 13 sensors integrated into a single holder allowing uniformity measurements. Holders with different shapes and designs available upon request. Our RFEA systems have a range of replaceable sensing elements with different signal sensitivities to probe a wide range of plasma ion current densities. They also allow for a range of pressures meaning a single system can be used for multiple plasma densities and pressure ranges. The replaceable sensing elements can be purchased as a spare part and can be easily replaced by the user when maintenance is required.
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