By Impedans Ltd
The Plato Probe is a planar Langmuir Probe designed to work in deposition plasmas when an insulating film will be deposited on the probe surface. The deposition tolerant probe can remain inside a plasma reactor while deposition processes are in progress. This allows the plasma parameters such as plasma density, Ion current density and electron temperature to be measured in systems where a standard Langmuir probe would not be suitable, such as plasma enhanced chemical vapour deposition (PECVD) systems. This probe also has a sync function for time resolved measurements, to look at plasma evolution in Pulsed DC and HiPIMS processes with 1 microsecond resolution. Measure Key Plasma Parameters Live Measure the key plasma parameters such as electron temperature, ion density, plasma potential and electron energy distribution function. Deposition Tolerant The probe functions correctly even when coated with a thin layer of non conductive material. Easy Installation Our Langmuir Probe systems are modular and can be quickly and easily installed on chambers with various flange options. Our probes are also compatible with almost all chamber types. Intuitive Software Our software, which can be installed on any PC or laptop, is very intuitive and user friendly. Spatial Measurements All of the products in our Langmuir range come with an optional linear drive. This can be used to automatically scan across the wafer and spatially characterize your plasma. Replaceable Tips All of our Plato Probes come with tips that can be easily replaced. Multiple Probe Models We have multiple models including fixed shaft and flexible shaft versions which allow for easy installation in all scenarios. Broadband RF Range Our Plato Probe technology does not require RF filters and will work for all plasma types. Measure the key parameters of your plasma so that you can understand and control the outcome. Measure the parameters in real time, allowing you to make changes and monitor the effects live, saving hours of unnecessary setup and waiting. The probe has multiple custom options including right angle elbows and flexible probe shafts to fit any chamber. Plato probe with a fixed length shaft will need a direct line of sight into the plasma from the vacuum port. If direct line of sight cannot be achieved then using the Flexible Plato probe this limitation can be overcome. Available Models: - Fixed Probe 10mm (Part Number 02-0073-01): 9.5mm OD, rigid, Alumina Shaft - Flexible Probe (Part Number 02-0240-01): Rigid tip section with flexible ceramic beaded cable - Feed-through for flexible shaft models (Part Number 02-0239-01): Feed-through for flexible Plato Probes - Electronics Unit (Part Number 02-0238-01): VI scanning and measurement electronics - 150mm Linear Drive (Part Number 02-0507-01): For rigid probe shafts only - 300mm Linear Drive (Part Number 02-0033-03): For rigid probe shafts only - 450mm Linear Drive (Part Number 02-0034-04): For rigid probe shafts only - 600mm Linear Drive (Part Number 02-0035-04): For rigid probe shafts only - 900mm Linear Drive (Part Number 02-0508-01): For rigid probe shafts only Information on Multiple Tip Styles Available Upon Request
With the Impedans Octiv unit, we have revolutionized the impedance characterization process, making it more efficient and user-friendly than ever before. Our state-of-the-art technology provides real-time impedance readings, allowing you to move the match unit’s load and tune motors seamlessly through their full range while capturing data on the fly. The Impedans Octiv unit allows you to export all your captured data easily in CSV format. This streamlines your documentation and analysis, making it a breeze to interpret and share your characterization results. Best for: RF Calibration, RF Parameters, Live Process Monitoring, Fault Detection & Classification. Measures: RF Voltage, Current, Phase, Power and Impedance of the fundamental and harmonic frequencies. Also measures RF waveform and ion flux.
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Our systems come with an optional linear drive which allows you to scan spatially across your plasma. The software communicates with the linear drive allowing you to control the positioning and plot the data within the software saving you time and effort when analyzing your data. The linear drives come with bellows support, a full cover and manual readouts. Our linear drives also come with a CF40 flange but adapters can be provided. This can be used to automatically scan across the wafer and spatially characterize your plasma.
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All of our langmuir probes come with replaceable tips meaning they can easily be replaced when maintenance is required. We have several tip and material options to choose from to best suit your application. All of our langmuir systems come with options for single probe, double probe, planar, spherical and mach probe heads where the heads can be interchanged and the tips can be easily replaced. Information on Multiple Tip Styles Available Upon Request
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The Quantum system is comprised of a retarding field energy analyser with integrated quartz crystal microbalance (QCM), used to measure the ion energy distribution (IED) and the ion-neutral deposition ratio at a surface inside a plasma reactor. This system measures and displays deposition rates, IED, ion flux and the DC bias voltage at the surface on which the sensor is deployed. Using crystals coated with specified materials, the system can also measure etch rates of ions and neutrals. The system was designed to be mounted on electrically biased surfaces including radio-frequency (RF). A unique shielding structure allows accurate detection of the millivolt level, 6 MHz, crystal oscillation frequency in the presence of RF bias levels up to 900 V peak-to-peak. Unlike other QCM systems, no water cooling of the crystals is needed. A compensation crystal, mounted next to the measurement crystal, is not exposed to plasma particles and used to compensate for temperature effects on the oscillating frequency of the measurement Measure Key Process Performance Parameters Live: Measure the key parameters of process performance; ion flux, ion energy distribution function, deposition rate and ion-neutral ratio. Measure Deposition Rate: The quantum system has an embedded quartz crystal microbalance that allows deposition rate to be monitored. Easy Installation: Our Langmuir probe systems are modular and can be quickly and easily installed on chambers with various flange options. Intuitive Software: Our software, which can be installed on any PC or laptop, is very intuitive and user friendly. Substrate Options: Our RFEA sensors come with multiple substrate shapes and materials. Replaceable Sensing Elements: All of our systems come with replaceable sensing elements (button probes) which can be easily replaced when maintenance is needed. Measure the key parameters of process performance; ion flux, ion energy distribution function, deposition rate and aspect ratio. Measure the parameters in real time, allowing you to make changes and monitor the effects live, saving hours of unnecessary setup and waiting. The Quantum system is comprised of a retarding field energy analyzer with integrated quartz crystal microbalance (QCM), used to measure the ion energy distribution (IED) and the ion-neutral deposition ratio at a surface inside a plasma reactor. This system measures and displays deposition rates, IED, ion flux and the DC bias voltage at the surface on which the sensor is deployed. The Quantum provides insight for fundamental research and for plasma model validation. Our RFEA systems are very easy to install in any plasma chamber. The system is small enough to be easily portable meaning a single system can be used in multiple chambers. It has an electrical feedthrough, a detachable holder substrate and replaceable sensors. the electrical feedthrough comes with a CF40 flange but we can also provide adapters to alternative flanges as needed. Our software has been designed to be easy to use and can be installed on any laptop or PC. Once installed the software allows the user to configure the system, run the scan, visualize the data and import/export data as needed. The system will automatically calculate the IEDF results and in the case of a multi sensor Semion system the software will generate contour maps of energy and flux uniformity over the wafer area. The sensing elements and holder substrates are available in anodised aluminium, bare aluminium or stainless-steel options. We also have holder substrate options with up to 13 sensors integrated into a single holder allowing uniformity measurements. Holders with different shapes and designs available upon request. Our RFEA systems have a range of replaceable sensing elements with different signal sensitivities to probe a wide range of plasma ion current densities. They also allow for a range of pressures meaning a single system can be used for multiple plasma densities and pressure ranges. The replaceable sensing elements can be purchased as a spare part and can be easily replaced by the user when maintenance is required.
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