By Impedans Ltd
The Alfven 100 is an advanced, all-in-one diagnostic instrument for plasma arc detection and RF pulse monitoring. The Alfven architecture enables real-time processing of RF measurements with one microsecond resolution. It is designed to detect and characterize arcs while simultaneously monitoring every RF pulse to check that each pulse is within a predefined specification. Arcs and misfiring RF pulses can lead to wafer defects, therefore, the Alfven 100 is an essential tool for rapid troubleshooting and 24/7 monitoring. Detect & Categorize Arcs Monitor RF Pulses Intuitive Software Recipe Function Snapshot Function Detect arcs that could be damaging your product and classify them into categories based on amplitude and duration. Monitor ON-yime, pulse frequency and duty cycle of every pulse and report on deviations. Our software, which can be installed on any PC or laptop, is very intuitive and user friendly. Adjust the sensors settings automatically for complex multi step plasma processes. Take a snapshot of events or at a dedicated time to check pulse shape. The sensor monitors and classifies the number of arcs per process, which can lead to undesirable particle creation, generating a summary report for the process. The classification of the arcs is configurable within the software, allowing the user to set severity bands based on arc amplitude and duration. The sensors have a 1 μs resolution for arcs (with adjustable noise filter). The sensors monitor ON-time, pulse frequency and duty cycle of every pulse and works for ON-OFF and multi-level pulsing (up to 3 levels). The resolution of the sensors is 1 μs for atypical pulses (with adjustable noise filter). Max., min. and average voltage and current are also reported during pulses to monitor "overshoot". The sensors report on deviations from user configured acceptance limits which can be configured in the software. Our software has been designed to be easy to use and can be installed on any laptop or PC. Once installed the software allows the user to configure the system, run the scan, visualize the data and import/export data as needed. The sensors come with a recipe function which allows the user to instruct the sensor to adjust settings automatically to follow complex, multi-step plasma processes. This allows the sensors to be used for process where the pulse scheme changes during a single run. The sensor comes with a snapshot feature which allows you to take a snapshot of any events but also to schedule snapshots so that you can periodically monitor the pulsing characteristics. This saves time and cost to set up directional coupler-to-oscilloscope measurements. Available Models: Quick Change 6mm Socket 20mm Socket 1 5/8 EIA 3 1/8 EIA Part Number 02-0260-01 | Frequency Range 40kHz-121MHz | Max Power 1.5W – 12KW | Max Voltage/Current 1.85 kV pk / 9 A RMS | Connectors Quick change Part Number 02-0496-01 | Frequency Range 40 kHz – 121 MHz | Max Power 1.5W – 12KW | Max Voltage/Current 1.85 kV pk/ 9 A RMS | Connectors 6mm Socket Part Number 02-0498-01 | Frequency Range 400 kHz – 121 MHz | Max Power 1.5W – 12KW * | Max Voltage/Current 19.8 kV pk-pk /120A RMS | Connectors 20mm Socket Part Number 02-0497-01 | Frequency Range 400 kHz – 121 MHz | Max Power 1.5W – 12KW * | Max Voltage/Current 22.6 kV pk-pk /120A RMS | Connectors 20mm Socket Part Number 02-0499-01 | Frequency Range 400 kHz – 121 MHz | Max Power 3W – 30KW | Max Voltage/Current 19.8 kV pk-pk /120A RMS | Connectors EIA 1-5/8″ Part Number 02-0500-01 | Frequency Range 400 kHz – 121 MHz | Max Power 9W – 90KW | Max Voltage/Current 33.9 kV pk-pk /500A RMS | Connectors EIA 3-1/8″ *Connector dependent, see our product datasheet for more information See our datasheet for a list of available quick change connectors
With the Impedans Octiv unit, we have revolutionized the impedance characterization process, making it more efficient and user-friendly than ever before. Our state-of-the-art technology provides real-time impedance readings, allowing you to move the match unit’s load and tune motors seamlessly through their full range while capturing data on the fly. The Impedans Octiv unit allows you to export all your captured data easily in CSV format. This streamlines your documentation and analysis, making it a breeze to interpret and share your characterization results. Best for: RF Calibration, RF Parameters, Live Process Monitoring, Fault Detection & Classification. Measures: RF Voltage, Current, Phase, Power and Impedance of the fundamental and harmonic frequencies. Also measures RF waveform and ion flux.
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Our systems come with an optional linear drive which allows you to scan spatially across your plasma. The software communicates with the linear drive allowing you to control the positioning and plot the data within the software saving you time and effort when analyzing your data. The linear drives come with bellows support, a full cover and manual readouts. Our linear drives also come with a CF40 flange but adapters can be provided. This can be used to automatically scan across the wafer and spatially characterize your plasma.
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All of our langmuir probes come with replaceable tips meaning they can easily be replaced when maintenance is required. We have several tip and material options to choose from to best suit your application. All of our langmuir systems come with options for single probe, double probe, planar, spherical and mach probe heads where the heads can be interchanged and the tips can be easily replaced. Information on Multiple Tip Styles Available Upon Request
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The Quantum system is comprised of a retarding field energy analyser with integrated quartz crystal microbalance (QCM), used to measure the ion energy distribution (IED) and the ion-neutral deposition ratio at a surface inside a plasma reactor. This system measures and displays deposition rates, IED, ion flux and the DC bias voltage at the surface on which the sensor is deployed. Using crystals coated with specified materials, the system can also measure etch rates of ions and neutrals. The system was designed to be mounted on electrically biased surfaces including radio-frequency (RF). A unique shielding structure allows accurate detection of the millivolt level, 6 MHz, crystal oscillation frequency in the presence of RF bias levels up to 900 V peak-to-peak. Unlike other QCM systems, no water cooling of the crystals is needed. A compensation crystal, mounted next to the measurement crystal, is not exposed to plasma particles and used to compensate for temperature effects on the oscillating frequency of the measurement Measure Key Process Performance Parameters Live: Measure the key parameters of process performance; ion flux, ion energy distribution function, deposition rate and ion-neutral ratio. Measure Deposition Rate: The quantum system has an embedded quartz crystal microbalance that allows deposition rate to be monitored. Easy Installation: Our Langmuir probe systems are modular and can be quickly and easily installed on chambers with various flange options. Intuitive Software: Our software, which can be installed on any PC or laptop, is very intuitive and user friendly. Substrate Options: Our RFEA sensors come with multiple substrate shapes and materials. Replaceable Sensing Elements: All of our systems come with replaceable sensing elements (button probes) which can be easily replaced when maintenance is needed. Measure the key parameters of process performance; ion flux, ion energy distribution function, deposition rate and aspect ratio. Measure the parameters in real time, allowing you to make changes and monitor the effects live, saving hours of unnecessary setup and waiting. The Quantum system is comprised of a retarding field energy analyzer with integrated quartz crystal microbalance (QCM), used to measure the ion energy distribution (IED) and the ion-neutral deposition ratio at a surface inside a plasma reactor. This system measures and displays deposition rates, IED, ion flux and the DC bias voltage at the surface on which the sensor is deployed. The Quantum provides insight for fundamental research and for plasma model validation. Our RFEA systems are very easy to install in any plasma chamber. The system is small enough to be easily portable meaning a single system can be used in multiple chambers. It has an electrical feedthrough, a detachable holder substrate and replaceable sensors. the electrical feedthrough comes with a CF40 flange but we can also provide adapters to alternative flanges as needed. Our software has been designed to be easy to use and can be installed on any laptop or PC. Once installed the software allows the user to configure the system, run the scan, visualize the data and import/export data as needed. The system will automatically calculate the IEDF results and in the case of a multi sensor Semion system the software will generate contour maps of energy and flux uniformity over the wafer area. The sensing elements and holder substrates are available in anodised aluminium, bare aluminium or stainless-steel options. We also have holder substrate options with up to 13 sensors integrated into a single holder allowing uniformity measurements. Holders with different shapes and designs available upon request. Our RFEA systems have a range of replaceable sensing elements with different signal sensitivities to probe a wide range of plasma ion current densities. They also allow for a range of pressures meaning a single system can be used for multiple plasma densities and pressure ranges. The replaceable sensing elements can be purchased as a spare part and can be easily replaced by the user when maintenance is required.
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