By Arradiance
The 1st commercially available Thermal and Plasma Enhanced Molecular Layer Deposition (MLD) system, VERDE enables you to expand your capability beyond inorganic films to organics and even hybrid films VERDE - your solution for advancing: - Organic Coatings - Functional Polymer Coatings - Energy Storage Innovations - Photonics and Quantum materials - Biomedical Devices - Flexible Electronics & Sensors Designed specifically to address the unique challenge of handling and delivering organic precursors Engineered to excel at growing organic films In situ self-clean maintenance for organics Effectively supports and delivers the most challenging precursors Intuitive multi-level heads-up Graphical User Interface (GUI) Next generation safety protocols protecting the system and operators Fully supports 2D and 3D objects Field reconfigurable as your needs change Expand your reach of the Periodic Table to include Organic precursors ARRADIANCE Features Thermal & Plasma-Enhanced MLD/ALD (Flow Thru & Expo Modes) Deposition Modes R&D Scale-Up & Production Usage Up to QTY 20 - 200mm wafers or 210 x 210mm panels Chamber Volume 2D (Wafers) & 3D (Particles & Objects) Substrate Types Organic and Inorganic Precursor Material Supported Configurable Precursor Sources Extremely Low Vapor Pressure Materials Pressure Control Air-Cooled (No Chilled Water required) Cooling Stand alone or Glovebox Integration Standard Metrology Port Metrology 36.72”x 65.25”x 74.78” Dimensions (W x D x H) CUSTOMER CONFIGURABLE TO MEET YOUR SPECIFIC CURRENT AND FUTURE FILM DEPOSITION REQUIREMENTS AND SUBSTRATE SUPPORT Featured in numerous publications, articles, and presentations around the world, The Arradiance ALD Technology delivers across diverse markets and applications
PRIME™ ALD & MLD systems, for production and R&D. Floor-standing MLD and ALD systems for advanced materials and complex structures. Leveraging the reliability and low cost of ownership of the proven GEMStar XT™ platform, PRIME delivers larger chambers, broader precursor support, and the capability to scale from research into production. More chamber. More chemistry. More control. PRIME is built for the labs and production teams pushing beyond the benchtop, whether you’re ramping up throughput or sizing up your 3D substrates. It handles inorganic and organic precursors, including extremely low-vapor-pressure materials, in both thermal and plasma-enhanced MLD and ALD. And yes — PRIME is completely air-cooled. No chill water required. Improved performance over the GEMStar XT platform - Chamber volume: 4× larger than GEMStar XT - Precursor materials supported: Inorganics and organics - Extremely low vapor-pressure materials: Yes - Deposition modes: Thermal MLD & ALD, plasma MLD & ALD; flow-through and exposure operation - Reactor temperature: Up to 300°C±1°C (450°C optional) - Pressure control: Yes - Substrate types: 2D (wafers) and 3D (particles & objects) — single-substrate and batch operation up to 200 mm or M12; batch up to 20×200 mm wafers or 210×210 mm panels - Targeted applications: Research and production - Cooling: Fully air-cooled — no chill water required Two base systems Configure your ideal MLD, ALD, or hybrid solution. Both bases are customer-configurable to meet your specific deposition requirements, with configurable options familiar to GEMStar customers.
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GEMStar XT · Thermal ALD The ALD deposition workhorse. For solar cell, biotechnology, energy research and beyond. GEMStar XT delivers reliable thermal ALD and MLD on the most demanding R&D bench. - Reactor temperature up to 300°C - Up to four movable bottle-heated zones - Gas distribution delivery up to 200°C - Pulsed Vapor Push (PVP™) for low-vapor-pressure precursors - Flow-through and exposure deposition modes - Substrates up to 200 mm — single-substrate or batch cassette; configurable end effectors (200 mm default, 150 mm and 100 mm options) - Proven beyond the lab: used in cluster tool configurations and on production lines - MFC-controlled carrier gas input - GEMFlow™ control software with real-time user interface
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PRIME™ VERDE · Thermal & plasma-enhanced MLD The first of its kind. PRIME VERDE was designed specifically to address the unique challenge of handling and delivering organic precursors — the first commercially available solution developed specifically for molecular layer deposition (MLD). - Specifically designed to excel at growing organic films - In-situ self-clean maintenance for organics - Effectively supports and delivers the most challenging precursors - Intuitive multi-level heads-up graphical user interface (GUI) - Next-generation safety protocols protecting the system and operators - Fully supports 2D and 3D objects - Field-reconfigurable as your needs change
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PRIME™ CUSTOM · Configure your ideal solution Start with a base. Build exactly what you need. Begin with either the PLATINUM or VERDE base, then configure it to meet your current and future MLD, ALD, or hybrid-film requirements. Not ready to buy yet? Our foundry can run your process on a PRIME system first, through our ALD and MLD coating services. - Customize for your substrates and specific precursors/materials - Numerous plug-and-play options to meet demanding requirements - Designed for ease of service and maintenance - Field-reconfigurable as your needs change - Substrate support tailored to your specific substrate(s)
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