By Impedans Ltd
The Langmuir Probe is one of the most common and widely used plasma diagnostics and measures parameters in the bulk of the plasma. The Impedans Langmuir Probe System measures the key plasma parameters such as floating potential, plasma potential, plasma density, ion current density, electron energy distribution function, electron temperature.
With the Impedans Octiv unit, we have revolutionized the impedance characterization process, making it more efficient and user-friendly than ever before. Our state-of-the-art technology provides real-time impedance readings, allowing you to move the match unit’s load and tune motors seamlessly through their full range while capturing data on the fly. The Impedans Octiv unit allows you to export all your captured data easily in CSV format. This streamlines your documentation and analysis, making it a breeze to interpret and share your characterization results. Best for: RF Calibration, RF Parameters, Live Process Monitoring, Fault Detection & Classification. Measures: RF Voltage, Current, Phase, Power and Impedance of the fundamental and harmonic frequencies. Also measures RF waveform and ion flux.
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Our systems come with an optional linear drive which allows you to scan spatially across your plasma. The software communicates with the linear drive allowing you to control the positioning and plot the data within the software saving you time and effort when analyzing your data. The linear drives come with bellows support, a full cover and manual readouts. Our linear drives also come with a CF40 flange but adapters can be provided. This can be used to automatically scan across the wafer and spatially characterize your plasma.
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All of our langmuir probes come with replaceable tips meaning they can easily be replaced when maintenance is required. We have several tip and material options to choose from to best suit your application. All of our langmuir systems come with options for single probe, double probe, planar, spherical and mach probe heads where the heads can be interchanged and the tips can be easily replaced. Information on Multiple Tip Styles Available Upon Request
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The Quantum system is comprised of a retarding field energy analyser with integrated quartz crystal microbalance (QCM), used to measure the ion energy distribution (IED) and the ion-neutral deposition ratio at a surface inside a plasma reactor. This system measures and displays deposition rates, IED, ion flux and the DC bias voltage at the surface on which the sensor is deployed. Using crystals coated with specified materials, the system can also measure etch rates of ions and neutrals. The system was designed to be mounted on electrically biased surfaces including radio-frequency (RF). A unique shielding structure allows accurate detection of the millivolt level, 6 MHz, crystal oscillation frequency in the presence of RF bias levels up to 900 V peak-to-peak. Unlike other QCM systems, no water cooling of the crystals is needed. A compensation crystal, mounted next to the measurement crystal, is not exposed to plasma particles and used to compensate for temperature effects on the oscillating frequency of the measurement Measure Key Process Performance Parameters Live: Measure the key parameters of process performance; ion flux, ion energy distribution function, deposition rate and ion-neutral ratio. Measure Deposition Rate: The quantum system has an embedded quartz crystal microbalance that allows deposition rate to be monitored. Easy Installation: Our Langmuir probe systems are modular and can be quickly and easily installed on chambers with various flange options. Intuitive Software: Our software, which can be installed on any PC or laptop, is very intuitive and user friendly. Substrate Options: Our RFEA sensors come with multiple substrate shapes and materials. Replaceable Sensing Elements: All of our systems come with replaceable sensing elements (button probes) which can be easily replaced when maintenance is needed. Measure the key parameters of process performance; ion flux, ion energy distribution function, deposition rate and aspect ratio. Measure the parameters in real time, allowing you to make changes and monitor the effects live, saving hours of unnecessary setup and waiting. The Quantum system is comprised of a retarding field energy analyzer with integrated quartz crystal microbalance (QCM), used to measure the ion energy distribution (IED) and the ion-neutral deposition ratio at a surface inside a plasma reactor. This system measures and displays deposition rates, IED, ion flux and the DC bias voltage at the surface on which the sensor is deployed. The Quantum provides insight for fundamental research and for plasma model validation. Our RFEA systems are very easy to install in any plasma chamber. The system is small enough to be easily portable meaning a single system can be used in multiple chambers. It has an electrical feedthrough, a detachable holder substrate and replaceable sensors. the electrical feedthrough comes with a CF40 flange but we can also provide adapters to alternative flanges as needed. Our software has been designed to be easy to use and can be installed on any laptop or PC. Once installed the software allows the user to configure the system, run the scan, visualize the data and import/export data as needed. The system will automatically calculate the IEDF results and in the case of a multi sensor Semion system the software will generate contour maps of energy and flux uniformity over the wafer area. The sensing elements and holder substrates are available in anodised aluminium, bare aluminium or stainless-steel options. We also have holder substrate options with up to 13 sensors integrated into a single holder allowing uniformity measurements. Holders with different shapes and designs available upon request. Our RFEA systems have a range of replaceable sensing elements with different signal sensitivities to probe a wide range of plasma ion current densities. They also allow for a range of pressures meaning a single system can be used for multiple plasma densities and pressure ranges. The replaceable sensing elements can be purchased as a spare part and can be easily replaced by the user when maintenance is required.
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