By Laurell Technologies Corporation
Better control saves time and money Stop guessing! Determine in real-time when your substrate is fully rinsed. - Constantly measures the drain fluid's electrical conductivity to determine when to end the rinse and start drying - Accurately detecting when the chemical has been adequately rinsed from the substrate and process chamber completely removes this variable, especially when different process chemicals concentrations are used. - Sensing a resistivity setpoint can be fully integrated into your processing sequence. Don't worry, there's also an adjustable bypass time in case something unexpected happens while the system is running unattended. - A rinse-to-resistivity sensor, combined with our Drain Diverter Valve, allows you to program and control the waste stream at all stages of your process - Saves processing TIME (the absolute best result in the shortest possible time — no more guessing!) - Saves Rinse MATERIAL COST (solvent / DI water) - Saves Waste DISPOSAL COST (eliminates unnecessarily wasted resources year after year)
Spin Coaters and Spin Processors. Models shown: Laurell EDC Spin Processor with Touch Control and foot switch, Laurell H6-8 Headless, Laurell EDC Spin Processor in Wet Station, Laurell H6-8 Spin Processor in Wet Station.
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Using the right chuck improves coating quality. High porosity chucks for standard cover slip sizes and embedded chucks for standard microscope slides are available direct from Laurell. If you have an unusual shape and/or size substrate, a custom chuck can be made for a perfect fit.
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Spin Coaters and Spin Processors. Models shown: Laurell H6-23 Headless, Laurell H6-23 with extended upper housing, Laurell WS-650-23 wet station, Laurell Spin Coater with Single Shot Dispenser (SSD).
CATEGORY
