We have the capability to pattern lines down to a resolution of 20 nm half pitch or 50,000 line pairs/mm (lp/mm). Using the latest technology in high-resolution direct-write patterning and electron beam lithography allows for custom pattern fabrication and for high-efficiency gratings for hard X-ray applications Our custom gratings can be used in synchrotron and lab-based systems for a range of applications. Contact us for more details for your specific needs Custom transmission gratings for EUV and higher energy X-ray systems. Our direct-write, fast through-put process allows for higher resolution gratings from several hundred micrometres to millimetres. Various metals can be fabricated on thin membranes of Si3N4, SiC, or Si.
X-rays below 5 keV (<~0.25 nm) are typically classified as soft X-rays, where they are more readily absorbed than higher energy X-rays. Typically, zone plates do not require the same thickness for efficiency and allow for higher resolution imaging. A range of zone plate options for soft/tender X-Rays are available for specific requirements. (Custom Designs Available) Device | Outer Zone Width ΔR n (nm) | Thickness (µm) | Outer Diameter (µm) | ( of zones) E/ΔE Limit | ~ Focal Length(µm) SZP‑90um‑15nm | 15 | <0.07 | 90 | 1514 | 325 SZP‑120um‑15nm | 120 | 2019 | 433 SZP‑200um‑18nm | 18 | <0.15 | 200 | 2797 | 868 SZP‑270um‑18nm | 270 | 3775 | 1172 SZP‑320um‑18nm | 320 | 4473 | 1389 SZP-200um-25nm | 25 | <0.24 | 200 | 2007 | 1207 SZP‑250um‑25nm | 250 | 2509 | 1510 SZP-300um-25nm | 300 | 3010 | 1811 SZP-360um-25nm | 360 | 3612 | 2173 TZP‑160um‑50nm | 50 | <0.75 | 160 | 801 | 1934 TZP‑280um‑50nm | 280 | 1401 | 3384 TZP‑750um‑200nm | 200 | <0.75 | 750 | 938 | 36292 TZP‑1250um‑200nm | 1250 | 1563 | 60487 For estimated efficiency of zone plate, please see our online calculator at www.appliednt.com/zpcalc
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Zone plate efficiency for binary zone plates requires high aspect ratio structures which can survive high flux imaging systems. The “Oxide Interlock” option creates small interconnecting channels between metal zone of silicon dioxide which is transparent to hard X-rays and does not swell or distort, even when not under vacuum. These have been shown to significantly increase the zone plate efficiency and lifetime.
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Our standard frame size is 5 mm x 5 mm. We also offer custom frame sizes. Membrane thickness can be down to 50 nm and silicon carbide membranes are available for those requiring long-lifetime membranes. Low stress 50 nm silicon nitride membrane Low stress 200 nm silicon carbide membrane Fused Silica Substrate (~500 um thick) Custom chip sizes
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