By Impedans Ltd
OCTIV Mono 2.0 is a through-line RF Power meter, directional power sensor and impedance analyser. It measures a single fundamental frequency and it has a NIST traceable full scale accuracy of 1%. Its is a non-intrusive, in-line sensor used to calibrate RF power output from RF generators, verify match unit impedance range and efficiency and for general purpose power meter measurements. It can be used as a stand-alone instrument with our software suite or integrated directly with any software platform using standard communication protocols. There is a solution for every RF application including CW, pulsed and frequency tuning. Multiple Frequencies: Only one sensor required for multiple frequency applications, saving significant cost. Measurements available when frequency is +/-10% of the calibrated frequency. Measurement Accuracy: 1% Accurate voltage, current, power and impedance over a range of impedances traceable to NIST, ensuring reproducible and repeatable data from sensor to sensor. Intuitive Software: Our software, which can be installed on any PC or laptop, is very intuitive and user friendly. Multiple Models: We have multiple models to suit you installation and voltage/current/power requirements for seamless integration into your process equipment and control loop. Pulse Features: Measure the waveform of your pulse with our time-resolution mode. Communication Protocols: Ethernet, EtherCAT, RS232 and USB APIs available for ease of integration with any system. Five fundamental frequencies on a single sensor, saving cost of purchasing multiple sensors and time having to switch between sensors when taking readings. RF Frequency tracking band of ± 10% around the fundamental frequency allows accurate readings even when the frequency is variable around the fundamental. Achieve in-line accuracy specifications comparable to expensive offline vector network analyzers. Our calibration uses RF calorimetry and vector network analyzer technology to embed the power of both methods in a compact and responsive form factor. Due to the sampling methods used in our technology we do not require the same amount of averaging as a calorimeter or directional coupler to provide an accurate reading meaning you get quicker accurate readings. Our sampling methods also use advanced harmonic rejection which ensures accurate power measurement at the selected frequency only and does not require any physical filters. Our sensors are also calibrated up to 80° C to compensate for temperature variation. Sensor run-to-run repeatability (< 0.1%), enabling a true gauge of plasma process drift. Our software has been designed to be easy to use. It can be installed on any laptop or PC using our simple installers. Our software can be used to control multiple sensors simultaneously allowing you to monitor multiple locations at once. The software is also compatible across Octiv models meaning multiple Octiv models can be controlled from a single computer. Once installed the software allows the user to select between sensors, configure each sensor, runs scans, visualize live data and import/export data for analysis. We have multiple models of sensor to allow for varying installation locations and power/voltage/current requirements. Our standard QC connector model can come with various connectors (see datasheet for full list of connectors) that can be chosen at the time of ordering. All of our socket style connectors come with a leaf spring design (as shown in the image) which ensures that good electrical contact is made between the pin and the socket. Auto-switching between CW and Pulsed RF monitoring in time average mode (TAM). Reports pulse frequency and duty cycle with sub-microsecond precision in TAM. Integrates over pulse profile for accurate average power and impedance measurement. Time-resolved mode with 1 microsecond resolution for detailed pulse waveform analysis. Pulse-trend mode to monitor a number of points within the pulse profile, with 1 microsecond gate times Software or systems on your site can communicate directly with the sensor without using our software through our API protocols. The sensor is enabled for RS232, USB and Ethernet or EtherCAT. For more details on the API please contact us. Available Models: Quick Change, 6mm Socket, 20mm Socket, 1 5/8 EIA, 3 1/8 EIA Part Number 02-0323-01: Frequency Range 40kHz-4MHz, Max Power 0.5W – 5KW, Max Voltage/Current 1.85kV pk/9A rms, Connectors Quick change Part Number 02-0231-01: Frequency Range 350kHz – 240MHz, Max Power 1.5W – 12KW, Max Voltage/Current 1.85kV pk/9A rms, Connectors Quick change Part Number 02-0311-01: Frequency Range 350kHz – 240MHz, Max Power 1.5W – 12KW, Max Voltage/Current 1.85kV pk/80 A rms, Connectors 6mm Socket Part Number 02-0313-01: Frequency Range 350kHz – 240MHz, Max Power 1.5W – 12KW, Max Voltage/Current 22.6kV pk-pk/120A rms, Connectors 20mm Socket Part Number 02-0318-01: Frequency Range 350kHz – 240MHz, Max Power 3W – 30KW, Max Voltage/Current 19.8kV pk-pk/120A rms, Connectors EIA 1-5/8" Part Number 02-0320-01: Frequency Range 350kHz – 240MHz, Max Power 9W – 90KW, Max Voltage/Current 33.9kV pk-pk/500A rms, Connectors EIA 3-1/8" Connector dependent, see our product datasheet for more information See our datasheet for a list of available quick change connectors
With the Impedans Octiv unit, we have revolutionized the impedance characterization process, making it more efficient and user-friendly than ever before. Our state-of-the-art technology provides real-time impedance readings, allowing you to move the match unit’s load and tune motors seamlessly through their full range while capturing data on the fly. The Impedans Octiv unit allows you to export all your captured data easily in CSV format. This streamlines your documentation and analysis, making it a breeze to interpret and share your characterization results. Best for: RF Calibration, RF Parameters, Live Process Monitoring, Fault Detection & Classification. Measures: RF Voltage, Current, Phase, Power and Impedance of the fundamental and harmonic frequencies. Also measures RF waveform and ion flux.
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Our systems come with an optional linear drive which allows you to scan spatially across your plasma. The software communicates with the linear drive allowing you to control the positioning and plot the data within the software saving you time and effort when analyzing your data. The linear drives come with bellows support, a full cover and manual readouts. Our linear drives also come with a CF40 flange but adapters can be provided. This can be used to automatically scan across the wafer and spatially characterize your plasma.
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All of our langmuir probes come with replaceable tips meaning they can easily be replaced when maintenance is required. We have several tip and material options to choose from to best suit your application. All of our langmuir systems come with options for single probe, double probe, planar, spherical and mach probe heads where the heads can be interchanged and the tips can be easily replaced. Information on Multiple Tip Styles Available Upon Request
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The Quantum system is comprised of a retarding field energy analyser with integrated quartz crystal microbalance (QCM), used to measure the ion energy distribution (IED) and the ion-neutral deposition ratio at a surface inside a plasma reactor. This system measures and displays deposition rates, IED, ion flux and the DC bias voltage at the surface on which the sensor is deployed. Using crystals coated with specified materials, the system can also measure etch rates of ions and neutrals. The system was designed to be mounted on electrically biased surfaces including radio-frequency (RF). A unique shielding structure allows accurate detection of the millivolt level, 6 MHz, crystal oscillation frequency in the presence of RF bias levels up to 900 V peak-to-peak. Unlike other QCM systems, no water cooling of the crystals is needed. A compensation crystal, mounted next to the measurement crystal, is not exposed to plasma particles and used to compensate for temperature effects on the oscillating frequency of the measurement Measure Key Process Performance Parameters Live: Measure the key parameters of process performance; ion flux, ion energy distribution function, deposition rate and ion-neutral ratio. Measure Deposition Rate: The quantum system has an embedded quartz crystal microbalance that allows deposition rate to be monitored. Easy Installation: Our Langmuir probe systems are modular and can be quickly and easily installed on chambers with various flange options. Intuitive Software: Our software, which can be installed on any PC or laptop, is very intuitive and user friendly. Substrate Options: Our RFEA sensors come with multiple substrate shapes and materials. Replaceable Sensing Elements: All of our systems come with replaceable sensing elements (button probes) which can be easily replaced when maintenance is needed. Measure the key parameters of process performance; ion flux, ion energy distribution function, deposition rate and aspect ratio. Measure the parameters in real time, allowing you to make changes and monitor the effects live, saving hours of unnecessary setup and waiting. The Quantum system is comprised of a retarding field energy analyzer with integrated quartz crystal microbalance (QCM), used to measure the ion energy distribution (IED) and the ion-neutral deposition ratio at a surface inside a plasma reactor. This system measures and displays deposition rates, IED, ion flux and the DC bias voltage at the surface on which the sensor is deployed. The Quantum provides insight for fundamental research and for plasma model validation. Our RFEA systems are very easy to install in any plasma chamber. The system is small enough to be easily portable meaning a single system can be used in multiple chambers. It has an electrical feedthrough, a detachable holder substrate and replaceable sensors. the electrical feedthrough comes with a CF40 flange but we can also provide adapters to alternative flanges as needed. Our software has been designed to be easy to use and can be installed on any laptop or PC. Once installed the software allows the user to configure the system, run the scan, visualize the data and import/export data as needed. The system will automatically calculate the IEDF results and in the case of a multi sensor Semion system the software will generate contour maps of energy and flux uniformity over the wafer area. The sensing elements and holder substrates are available in anodised aluminium, bare aluminium or stainless-steel options. We also have holder substrate options with up to 13 sensors integrated into a single holder allowing uniformity measurements. Holders with different shapes and designs available upon request. Our RFEA systems have a range of replaceable sensing elements with different signal sensitivities to probe a wide range of plasma ion current densities. They also allow for a range of pressures meaning a single system can be used for multiple plasma densities and pressure ranges. The replaceable sensing elements can be purchased as a spare part and can be easily replaced by the user when maintenance is required.
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