The Vistec SB254 electron beam lithography system has been designed as a universal and cost-effective tool for both direct write and mask making applications to allow the customers to react quickly to market demands. With its 210 mm x 210 mm stage travel range it is the ideal tool for exposing masks up to 7 inch and wafers up to 200 mm diameter. Key Features - Substrate sizes: Wafers from 2" up to 200 mm, 5" - 7" masks - Substrate handling: Fully automated handling via SMIF pod - Clean room footprint: < 27 m ²(SB254 incl. service area)
