By Laurell Technologies Corporation
Improve your process by controlling the exhaust - Control exhaust in each step of your process - Create the ideal atmosphere for repeatable thin film uniformity even if your exhaust source is not completely stable - Some processes (particularly thin coatings) are very sensitive to even the smallest gas flow within the process chamber when drying - You can now automatically control the application of exhaust as part of a process - It is now possible to create a static or reduced flow condition then fully exhaust vapors before opening the process chamber - A retrofit is available for nearly all Laurell spin processors
Spin Coaters and Spin Processors. Models shown: Laurell EDC Spin Processor with Touch Control and foot switch, Laurell H6-8 Headless, Laurell EDC Spin Processor in Wet Station, Laurell H6-8 Spin Processor in Wet Station.
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Using the right chuck improves coating quality. High porosity chucks for standard cover slip sizes and embedded chucks for standard microscope slides are available direct from Laurell. If you have an unusual shape and/or size substrate, a custom chuck can be made for a perfect fit.
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Spin Coaters and Spin Processors. Models shown: Laurell H6-23 Headless, Laurell H6-23 with extended upper housing, Laurell WS-650-23 wet station, Laurell Spin Coater with Single Shot Dispenser (SSD).
CATEGORY
