By Leibniz Institute for Solid State and Materials Research Dresden - IFW Dresden
For a surface sensitive chemical analysis our X-ray excited photoelectron spectroscopy supports you. The method is well-suited for a non-destructive (depth) analysis down to 10 nm. Primarily, semiconducting and metallic materials, as well as, their oxides are investigated. The sample preparation of organic and metallic thin films under ultra-high vacuum conditions is also possible and part of the service. XPS PHI 5600-CI Technical data PHI Spectrometer with 150mm hemispherical analyser 16 Slot Multi-channeltron Detector Monochromated Al K(alpha) X-ray source Switchable X-ray source with Al- and Mg-Anodes Sample requirements Ultra-high vacuum and x-ray resistant Solid, dry samples as bulk pellets, thin films or powders Recommended size for compacted samples: max. 20 mm diameters and 10 mm thickness Benefits Analysis (Elements from Li or above) of elemental composition and their detailed chemical binding states Investigation of depth profiling of the elemental composition by repeatedly sputtering down to 500nm Non-destructive layered structure analysis by angle dependent XPS down to 10nm ( suitable for natural oxide layers) Valence state analysis for conducting samples with Helium discharge light source Thin film preparation of metallic (DC-sputtering) or organic (sublimation) thin films under ultra-high vacuum conditions in separate preparation chambers
