NW
Lithography & NanopatterningFabrication & Surface Engineering

Hot Embossing

By MP4MNT

EVG, EVG510 PiQuET Laboratory, Lab S4b, ISO6 A versatile wafer bonding system capable of handling substrate sizes ranging from small pieces up to 200 mm. Max contact force: 10, 20, 60 kN - Single chips processing - Manual loading chamber - Vacuum:Standard: 0.1 mbar - Many thermoplastics can be used for hot embossing, such as PMMA, PC, PE, COC, COP, PS, PVDF, … - High aspect ratios with lateral resolution down to 0,1 µm can be obtained - Highly precise moulding of any structures in polymers, especially microstructures with aggressive aspect ratio (up to 150:1)