By XRnanotech
Our high aspect ratio structures are engineered to meet the demands of high diffraction efficiency optics such as gratings and zone plates. We consistently achieve optimal aspect ratios up to 20 with ease, ensuring superior performance for X-ray microscopy applications. Our exceptional developments with deep reactive etching have recorded aspect ratios as high as 200 for nanowires and other structures. These state-of-the-art fabrication capabilities are sure to deliver unparalleled diffraction efficiency, setting us apart from our competitors in X-ray microscopy.
