We have much experiences of EB lithography more than 20 years. Crestec Corporation provides foundry service of EB lithography. We can expose fine grating patterns for DFB-LD production, and also any kind of R&D patterns. Please feel free to contact us with your preferred pattern layout. Applications: - DFB-LD (Optical communication devices) - HEMT devices (T-gate) - Next generation LSI devices - Quantum effect devices - Nano-photonic devices - Nano-bio sensors / devices - Advanced nano - sensors - Integrated MEMS / NEMS - Plasmonic devices
