Customized silicon etch depths for rib waveguides. Available in dedicated runs only. Partial silicon etching is available only in dedicated runs. Partial etching can be used to create rib waveguides or grating couplers. We can customize the etch depth for your specific application. By using high accuracy electron beam lithography alignment, we can align the partially etched layer to the fully etched layer with an error of less than 50 nm. This allows for low-loss transitions between strip and rib waveguides.
