By Nanonex
Nanonex provides the complete nanonimprint lithography (NIL) technology solutions: tools, resists, masks, and processes. Nanoimprint lithography (NIL) is a new way of nanopatterning and a revolutionary solution to nanomanufacturing. NIL patterns nanostructures by the physical deformation of a deformable material using a mold. NIL can have sub-5 nm resolution and 1% CD control, and simultaneously achieve high-throughput, sub-10 nm structures and low cost -- a feat currently impossible using other existing lithographic methods. Nanonex NIL machines are based on a patented technology, that does not use solid plate(s) to press the wafer and masks. This new technology gives not only excellent uniformity over entire wafer in nanoscale, but also the precise alignment and extremely fast processing time (less than 40 sec for a thermal plastics resists). The new technology also allows a single NIL machine to perform all forms of nanoimprinting, including thermal and photocurable NIL and direct nanoimprinting. NIL resists require very little pressure to press, are fast in response, and have high pattern fidelity and excellent uniformity.
