High-precision molding of SRG-type waveguides for AR/MR glasses. We support both diffraction grating formation in high-refractive-index resin and etching of high-refractive-index inorganic materials such as SiC. With low-distortion imprinting using Dyad®, we mass-produce high-yield, high-quality waveguides. Support for Two Molding Process Types: We support both direct molding with high-refractive-index imprint resin and processes that etch high-refractive-index substrates such as SiC. We build materials and processes from the ground up. Low-Distortion Imprinting with the Fully Automatic UV Nanoimprint System Dyad®: The Hard-to-Hard method using our proprietary Dyad® minimizes pattern pitch misalignment between the In-Coupler and Out-Coupler, enabling high-precision molding while suppressing image quality degradation. High-Yield Mass Production: Low-distortion imprinting greatly improves waveguide yield without being affected by pupil size or FOV. Yield improvement in mass production directly contributes to cost reduction. Molding Experience with High-Refractive-Index Materials: We support molding of high-refractive-index imprint resin onto transparent glass substrates with n=2.0 or higher, stably forming diffraction gratings in a variety of shapes. Wafer Support up to phi 8″: Foundry services are currently available up to phi 8″. Dyad® systems are also sold in 8″ and 12″ formats, preparing for future large-diameter requirements. Integrated Support: In addition to foundry services, we also sell Dyad® systems. For customers considering in-house production, we provide integrated support for both equipment and processes. Two Supported Molding Types Type A: Direct Molding into High-Refractive-Index Resin (High-n resin imprint on high-n substrate): SRG-type diffraction gratings are formed on a high-refractive-index transparent substrate (glass n=2.0 or higher) using high-refractive-index imprint resin. - Substrate: high-refractive-index glass (n≥2.0) - Molding material: high-refractive-index imprint resin - Supports diffraction gratings in a variety of shapes Type B: High-Refractive-Index Substrate Etching (Substrate etching (e.g. SiC)): Diffraction gratings are formed by etching high-refractive-index substrates themselves, such as SiC and TiO2. Using imprint resin dedicated to etching, direct patterning onto inorganic films such as substrates is achieved. - Substrate: high-refractive-index materials such as SiC and TiO2 - Uses imprint resin dedicated to etching - High-precision patterning onto inorganic films such as substrates Specifications Supported Types: High-refractive-index resin molding (Type A) / high-refractive-index substrate etching (Type B) Substrate Refractive Index: Supports high-refractive-index transparent substrates with n = 2.0 or higher Imprint Method: Hard-to-Hard low-distortion imprinting with Dyad® Supported Wafer Sizes: Up to phi 8″ (foundry) / phi 8″ and phi 12″ (Dyad® system sales) Pattern Types: SRG-type diffraction gratings (In-Coupler / Out-Coupler) Features: Minimized pattern pitch misalignment and high yield through low distortion Yield Improvement Comparison and Molding Examples Dyad® Low-Distortion Imprinting: A yield improvement example for Dyad® molding compared with a conventional NIL method. The impact of pupil size and FOV variation on waveguide yield is minimized. Nanoimprint Diffraction Grating Pattern: SEM cross-sectional image of a diffraction grating pattern molded for AR waveguides. High-precision reproducibility of the grating shape was confirmed.
