Feature sizes as small as 60 nm with high performance electron beam lithography. Available in MPW and dedicated runs. Our silicon patterning process involves the definition of nano-scale features in silicon-on-insulator (SOI) using electron beam lithography (EBL) and reactive ion etching (RIE) processes. The substrate is a 220 nm silicon device layer with a 2 µm buried oxide layer and 725 µm handle wafer. The patterning process begins by cleaning and spin-coating a material that is sensitive to electron beam exposure. A device pattern is defined into this material using 100 keV EBL. Once the material has been chemically developed, an anisotropic ICP-RIE etching process is performed on the substrate to transfer the pattern into the underlying silicon layer. The etch is performed until there is no remaining silicon and the underlying oxide layer is exposed.
