By ASML
Our computational metrology option provides our customers with a high-density overlay map for every single TWINSCAN production wafer without increasing the metrology capacity. Through advanced computer modeling, it combines the high-density pre-exposure wafer mapping already carried out on every wafer by our TWINSCAN lithography systems with YieldStar metrology data. The resulting dense focus and overlay maps enable wafer-level process control that can improve overlay performance by 10-20%.
