By Korea Basic Science Institute
Conduct of research to identify causes of micro defects and degradation occurring in semiconductors/displays through the development of a light–ion beam-based imaging mass spectrometry system Research Content - Development and demonstration research of a high-resolution two-dimensional imaging analysis system for analyzing the chemical characteristics of devices - Development of device analysis systems and technologies based on light imaging with advanced light source control for micro defect detection and complex analysis - Development of high-resolution depth-direction compound analysis technologies based on soft etching to identify causes of degradation Research Infrastructure Possession of research equipment development infrastructure based on optical/mass imaging analysis - Based on cluster ion beam analytical technologies, development of an imaging mass spectrometry system capable of high-precision analysis of organic molecular biological samples and display-related materials/devices, while simultaneously focusing on the localization of surface processing and pretreatment technologies using gas cluster ion beams (GCIB) - Development and application research of multimodal optical microscopy systems capable of structural and molecular imaging by combining optical interference, confocal, and nonlinear imaging technologies for three-dimensional samples, along with AI-based analytical technologies
