By AMT&C Group (Advanced Magnetic Technologies & Consulting Group)
Thermal oxidation process of A3B5 semiconductors Method is based on wafer wet oxidation process thermal stimulation that defines the key structural features that govern VCSEL performance and yield. SemiTEq systems provide process in which a buried AlAs or high-Al-content AlGaAs layer is converted into aluminium oxide (AlOx) through controlled exposure to water vapour. This process forms the oxide aperture, the key structure defining VCSEL performance, efficiency and reliability.
