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Modeling for Thin Film Processing

By Schrodinger

Thin Film Processing Fast-track the next generation of electronic devices Optimize semiconductor processing with the power of digital simulations Scientists in the semiconductor industry are under constant pressure to deliver electronic devices that are smaller, more powerful, and more energy-efficient. Fabricating the next generation of device structures at the micro- or nano-scale is a huge and growing challenge. Schrödinger’s Materials Science platform offers advanced computational tools to help companies optimize atomic-level processing for electronics and other high-tech industries, and improve device performance. Intuitive computational workflows designed by experts in thin film processing - Easy-to-use system builders for all material types - Powerful workflows for molecular simulation, machine learning, and data analysis - Dedicated customer support and extensive training resources Solutions for the material and process challenges facing today’s electronics industry Optimize precursor materials - Compute key physical and chemical properties including volatility and thermal stability of precursors for thin film deposition or etch - Gain insights in silico into the chemistry at the surface, where precursors react with substrates - Speed up new precursor discovery with large-scale screening and machine learning Refine semiconductor fabrication - Identify the best precursor and co-reagent combinations for wafer processing by MOCVD, ALD, and etch - Predict surface reactivity to find the optimum windows for experimental process parameters - Gain atomic-level insights to help troubleshoot processes Simulate materials for more predictable chip and device manufacturing - Simulate materials properties that complement metrology and provide insights into device performance - Identify root causes of device failure by investigating materials at the atomic level - Test and screen new material combinations in silico