By Raith
Introduction Pattern generation is at the core of advanced nanofabrication writing techniques. Achieving resolutions and writing accuracies down to 10 nm or less requires intelligent layout management and high-precision control of both beam and stage movements. Modern pattern generators provide efficient writing capabilities. They support a wide variety of shapes and flexible, intelligent fill strategies for exposure. Algorithmic patterning enables the integration of user-defined code for custom shapes and layout formats, providing tailored solutions for new and complex applications. Accurate stitching supported by laser interferometer stages and stitch-free nanopatterning solutions are essential for maintaining precision and seamless fabrication across write field boundaries for elongated structures. High throughput is critical to support the patterning of full wafers or even larger substrates, ensuring efficiency in large-scale fabrication. Cutting-edge technology RAITH leads the industry with state-of-the-art direct patterning solutions, offering unparalleled precision and control for seamless fabrication processes. Comprehensive support RAITH customers benefit from extensive expertise and dedicated support, ensuring proper selection and optimal performance of seamless patterning solutions. Proven track record RAITH’s track record of success and innovation in seamless patterning speaks for itself, making it the trusted choice for achieving unique and precise fabrication results. Benefits Unlocking possibilities RAITH technologies make even the most challenging designs possible, offering advanced solutions and precise tools for fast design development. Enhancing final device quality Various stitch-free methods available for different RAITH tools ensure that your final device quality will not be compromised and will be delivered as it was supposed. From m² to nm Achieve sub-micron precision even on 1-meter substrates for flat TV panels with RAITH tools. Our stitch-free technology ensures quality patterning from square meters to nanometers. Patterning solutions for seamless designs Elements When small things needs to be big Achieving zero stitching error A unique feature is based on a fixed beam, moving stage with a “zero stitching error” approach. Unlike conventional stitching exposures, it utilizes sophisticated FBMS technology in an exclusive continuous writing mode. The beam remains stationary while the stage beneath it follows shaped paths of the desired patterns. Another method allows for the continuous writing of elongated paths, such as optical waveguides, without stitching; the width of the path is defined by dynamic beam expansion. Additionally, this unique exposure mode is based on a modulated beam, moving stage approach and complements the primary exposure mode. In this method, the repetitive periodic beam movement is defined. The combination of patterning and synchronized continuous movement of the laser interferometer stage results in stitch-free, strip-shaped periodic structures with high pattern fidelity, particularly important in photonics and plasmonics. Algorithmic patterning A novel patterning methodology designed to meet the escalating demand for efficient handling of new non-Manhattan shapes. This innovative approach enables the integration of user-defined algorithms into the pattern generator software through an userhook.dll, allowing operators to incorporate custom C# code. Consequently, the functionality of the EBL system can be expanded to accommodate new shapes and tailored design data formats at the pattern generator level. This flexibility makes it an invaluable tool for researchers and engineers by reducing turnaround times and allowing for rapid prototyping and development. Highly efficient data processing Highly efficient data processing ensures the best pattern fidelity achievable in the shortest possible time. Leveraging advanced algorithms and optimized workflows, it streamlines the data processing pipeline, facilitating rapid and precise pattern generation essential for cutting-edge applications in nanofabrication and beyond. Big substrate patterning The laser direct write series PICOMASTER XF’s optical module technology allows for rapid direct laser writing processes, which are fast enough to be used for substrates up to 1 meter (and even larger). It delivers swift processing speeds coupled with a resolution down to 600 nm. Providing stitch-free results, this cutting-edge technology ensures precise and seamless fabrication, empowering users to achieve intricate designs with unparalleled efficiency and accuracy in large display industries, packaging, and security markets. Applications for patterning Key factors 0 nm Stitching error Complete stitch-free strategies: PathControl technology allows entirely stitch-free exposures 1400 x 1400 Millimeters Unparalleled speed allows submicron patterning over huge substrates up to 2 square meters 1.000.000.000 Elements A metalens may contain even more elements, all of them need to be positioned with nanometer precision Application patterns Waveguides Stitch-free exposure of photonic circuits with PathControl technology Photonic crystal Stitch-free photonic crystal waveguide exposed by periodic patterning Metalenses Exposure of large photonic designs without data transfer overhead by algorithmic patterning DFB gratings Pitch control with sub-nm resolution Complex shapes User-defined shapes enabled by algorithmic patterning User-defined data formats Streamlined pattern transfer with user-fined design data processing by algorithmic patterning
