By Cnr Ifn
Dielectric metasurfaces and photonic crystals sustain electromagnetic modes which can be exploited to enhance nonlinear frequency-conversion processes such as second or third harmonic generations. IFN employs electron-beam lithography and reactive ion etching to fabricate silicon metasurfaces supporting electromagnetic resonances with different quality factors, ruled by the geometry. This allows to investigate the trade-off between resonant enhancement and matching the spectral bandwidth of the ultrafast excitation source.
