In Tekna’s ICP technology, the plasma is generated by transferring electrical energy from the induction coil to the gas flowing through a confinement tube, where the plasma discharge occurs. The radiofrequency current in the coil creates an alternating magnetic field, which in turn induces an annular electric field inside the discharge region. It is this induced electric field that drives ohmic heating of the gas, sustaining a stable plasma discharge. Depending on plasma operating conditions, the local temperature at the core of the discharge, which can easily reach 10 000 o C, is more than necessary to melt and evaporate any materials known to Man. Tekna’s core technology, inductively coupled plasma (ICP), is used across four key applications: the production of metal nanoparticles, the production of micron-sized metal powders through our atomization and spheroidization processes, the development of thermal protection systems using our supersonic plasma wind tunnels, and the development of materials for hypersonic applications. The following sections present each of these applications, along with the products and solutions they enable.
