By Chicago Materials Research Center
Zeiss GeminiSEM 560 FE-SEM Designed for ultra-low-kV imaging with sub-nm resolution Specifications - 0.5 nm resolution at 15 kV - 0.8 nm resolution at 1 kV - 1.0 nm resolution at 500 V - Detectors: InLens SE, EsB, ETSE, C2D, aBSD - NanoVP and VP modes - Oxford Ultim Max 100 EDS system - Oxford Ultim Extreme windowless EDS system - Insert sample transfer stage - IBSS GV10x DS Asher plasma cleaner - Spicer SC24 EMF cancellation Zeiss Merlin FE-SEM The Zeiss Merlin is a high-resolution Field Emission Scanning Electron Microscope (FE-SEM) designed for low-voltage imaging of delicate samples with resolution better than one nanometer. The Merlin has several low-noise backscatter and secondary electron detectors, a local charge compensation mode, and has been our primary tool for studying soft materials samples such as polymers, nanoparticles, and active biological materials such as patterned silicon nanowires. An Oxford Ultim Max 100 EDS system with AzetcLive enables ultrafast elemental characterization and mapping. Specifications - Probe continuously adjustable from 10pA to 40nA - 0.9 nm resolution at 15kV - 1.6 nm resolution at 1kV - Detectors: In-Lens SE, EsB, AsB, SE2 - Oxford Ultim Max 100 EDS system - 80mm Airlock - GIS Charge Compensator (N2) - IBSS GV10x DS Asher plasma cleaner - Spicer SC20 EMF cancellation JEOL JCM-7000 NeoScope Benchtop SEM Designed for ease of use and routine samples. Includes integrated EDS Specifications - SE and BSE detectors - High Vac, Low Vac, and Charge Reduction Modes - Integrated EDS - Live EDS and 3D modes
