By Jan Koum Center for Nanoscience and Nanotechnology, Tel Aviv University
Deposition (CVD). Deposits thin films of device-grade quality; ideal for hydrogenated amorphous silicon (a-Si) and various silicon compounds. Low-temp deposition (<200°C); Conformal coating of trenches and vias with high aspect ratios; equipped with vacuum load lock. Complementary to PECVD system, enabling lift-off processes.
