By INESC Microssistemas e Nanotecnologias
INESC MN specializes in a variety of deposition and processing methods, each optimized to address specific application requirements: - Physical Vapor Deposition (PVD): Magnetron Sputtering (DC and RF): DC Sputtering: Ideal for conductive materials, DC sputtering employs a constant direct current to generate plasma. This plasma then ejects atoms from a target material, which subsequently form a thin film on the substrate. RF Sputtering: Suitable for insulating materials, RF sputtering uses an alternating radio-frequency current to maintain plasma stability and prevent charge accumulation, enabling the deposition of high-quality films of non-conductive materials. Ion Beam Deposition: Utilizes an ion beam to sputter material from the target, which is then deposited onto the substrate. This method provides precise control over film thickness, crystallographic orientation and composition control. - Chemical Vapor Deposition (CVD): CVD Process: Chemical Vapor Deposition involves the chemical reaction of gaseous precursors on a heated substrate, resulting in the formation of thin films. This method excels in depositing conformal coatings over complex geometries and is particularly effective for producing high-purity dielectrics with excellent uniformity and film quality. Main Features: - Specialized Deposition for Magnetic Materials: Advanced deposition and processing tools support wafer sizes up to 200mm diameter, tailored specifically for magnetic multilayer thin films. - Batch processing (up to 25 wafer cassettes) - Exceptional Wafer Uniformity: Achieves excellent wafer uniformity with a precision of ±1%. - Magnetic-based Materials: MnIr, MnPt, MnNi, FeMn, MnRh, NiFe, several CoFe and CoFeB alloys, NiFeCr, TbCo, Fe, Co, CoZrNb, MnCrPt, CoPt, Dy, Gd FeB, Ni, NiO, Fe₃O₄, FeTa - Dielectric and transparent conductive materials: SiN, MgO, MgF2, MgAlO, Al 2 O 3, SiO 2, AlN, NiO, CrOx, TiOx, ITO, IZO, AZO and graphene. - Metals: GeSbTe, TiW(N), Al 5 Si 1.0 Cu 0.5, W, Ta, Ru, Pt, Al, Au, Ti, V, Cu, Ir, Pd, Zr, Hf, Re, Cr, Mn, Mo, Sn, Ge, Si, Alumel, TiAlV and Cromel - Semiconductor: Amorphous silicon Possible applications: - Spintronic technologies - Quantum technologies - Optics and Photonics - Semiconductor devices - Biomedical interfaces
