By xlith
Advanced microelectronics, photonics, nanotechnology – they all rely on high resolution electron beam lithography as the primary source for ultra-fine lateral patterns, generated directly on a functional substrate. Electron beam lithography is a computer controlled sequential writing process. It transfers designs from CAD layout description to physical object. It uniquely combines ultra-high resolution, overlay performance and direct, computer driven pattern generation. xlith offers an industry-first direct write electron beam lithography service, drawing on more than four decades of experience. To achieve outstanding results we combine - state-of-the-art electron beam equipment, additionally fine-tuned for optimum performance - thorough theoretical understanding - in-house developed simulation, correction and transcription tools - proprietary process technologies
