Lithography: Multi-scale capabilities

Vmicro has a long term experience of microfabrication engineering with design rules from 100 nm to 100 µm.

We are able to offer advanced lithography processes using e-beam and optical techniques.

Optical lithography from 1 µm to 100µm
E-beam lithography from 50 nm to 1µm
Fast prototyping with e-beam lithography on large areas
Wide range of resists: DUV, PMMA, Az nLOF, HSQ
Proximity correction for dense patterns generation with 100kV ebeam
Lithography sequences combining high resolution to thick resists. Mask engineering for deep etching of small structures