The EasyTube 3000EXT is a versatile Chemical Vapor Deposition (CVD) system designed for both academic research and industrial R&D. It is capable of synthesizing a wide range of nanomaterials on substrates up to 150mm x 150mm. The system features a 3-zone resistance furnace capable of reaching 1200°C, automated substrate loading, and can be configured for either atmospheric or low-pressure processes. It is specifically marketed for the growth of 1D materials like Carbon Nanotubes (CNTs) and Silicon Nanowires, as well as 2D materials such as Graphene, Transition Metal Dichalcogenides (TMDs), and hexagonal Boron Nitride (h-BN).