CVD Equipment Corporation - First Nano

The FirstNano ET6308 is a compact, multi-tube horizontal furnace system designed for research and development and pilot production environments. It is a configurable multi-stack system that builds on over two decades of industry use. The system is engineered for a wide array of thermal processes, including wet/dry oxidation, atmospheric and low-pressure annealing, dopant diffusion, and the deposition of various thin films such as polysilicon (doped and undoped), silicon nitride, and LTO silicon dioxide. It features precise temperature control and options for configurable precursor gas management and effluent gas abatement.

The FirstNano ET6000 is a multi-tube horizontal furnace system designed for batch wafer processing in R&D and pilot production. It can be configured with up to four independent process tubes, each capable of processing up to fifty 150mm wafers. The system supports both Atmospheric Pressure (APCVD) and Low-Pressure (LPCVD) processes and offers high-temperature options up to 1400°C. It is engineered for a variety of standard semiconductor thermal processes, including oxidation, annealing, diffusion, and the deposition of materials like polysilicon, silicon nitride, and various oxides (TEOS, PSG, BPSG).

The EasyTube 3000EXT is a versatile Chemical Vapor Deposition (CVD) system designed for both academic research and industrial R&D. It is capable of synthesizing a wide range of nanomaterials on substrates up to 150mm x 150mm. The system features a 3-zone resistance furnace capable of reaching 1200°C, automated substrate loading, and can be configured for either atmospheric or low-pressure processes. It is specifically marketed for the growth of 1D materials like Carbon Nanotubes (CNTs) and Silicon Nanowires, as well as 2D materials such as Graphene, Transition Metal Dichalcogenides (TMDs), and hexagonal Boron Nitride (h-BN).