Infinitesima

The Infinitesima Rapid Probe Microscope (RPM) is a modular scanning probe microscopy (SPM) system. It is designed for integration into other, larger systems ("host tools"), such as e-beam mask repair systems or wafer metrology platforms, for operation in either air or vacuum. The RPM is intended to provide hybrid metrology capabilities by combining its scanning probe technology with the host system's technology (e.g., e-beam). Its first commercial implementation is within the Zeiss MeRiT® neXT mask repair system.

The Infinitesima Metron3D is an automated Atomic Force Microscopy (AFM) system designed for high-volume manufacturing (HVM) process control in the semiconductor industry. It is engineered for high-throughput, in-line metrology of nanoscale structures on wafers, with a capacity of up to 170 wafers per hour. The system integrates advanced features such as a large, automatically exchangeable probe library and 3-axis interferometry for sub-nanometer precision. Its primary applications include characterizing EUV resists, analyzing CMP (Chemical-Mechanical Planarization) performance, and metrology for the front-end-of-line (FEOL) in logic device fabrication.