Vmicro

Vmicro has a long term experience of microfabrication engineering with design rules from 100 nm to 100 µm. We are able to offer advanced lithography processes using e-beam and optical techniques. Optical lithography from 1 µm to 100µm E-beam lithography from 50 nm to 1µm Fast prototyping with e-beam lithography on large areas Wide range of resists: DUV, PMMA, Az nLOF, HSQ Proximity correction for dense patterns generation with 100kV ebeam Lithography sequences combining high resolution to thick resists. Mask engineering for deep etching of small structures

Lprobes are based on a new MEMS patented technology enabling improvements as compared to silicon AFM cantilevers with tip fabricated using mainstream processes developed in the 90’s. Vmicro In-plane technology enables full batch fabrication of tips with high lengths, low masses and high aspect ratios not only close to apex. Both cantilever and tip are made of highly doped monocrystalline silicon. Lprobes are compatible with most SPMs. Our chip is designed with vertical sidewalls that enable safer handling with tweezers.

Lprobes are based on a new MEMS patented technology enabling improvements as compared to silicon AFM cantilevers with tip fabricated using mainstream processes developed in the 90’s. Vmicro In-plane technology enables full batch fabrication of tips with high lengths, low masses and high aspect ratios not only close to apex. Both cantilever and tip are made of highly doped monocrystalline silicon. Lprobes are compatible with most SPMs. Our chip is designed with vertical sidewalls that enable safer handling with tweezers.