Tokyo, 26 October 2026. Nikon Corporation has begun accepting orders for the FX-6ASLH, an FPD lithography system that achieves 0.85 µm (L/S) resolution. According to Nikon, it is the world's first FPD lithography system to deliver submicron resolution. The company says this is based on its research of publicly announced FPD lithography systems as of October 26, 2026.
The FX-6ASLH is designed for the G6 plate size, which covers 1,500 mm × 1,850 mm glass substrates for small- and medium-sized panels. It is optimized for the production of high-definition OLED and LCD panels used in advanced smart devices. Sales launch is scheduled for December 2027.
The system uses a newly developed illumination optical system incorporating a UV-LED light source. It achieves resolutions of 0.85 µm (L/S) and 1.0 µm (C/H) on G6 plates. Nikon states that the 0.85 µm resolution is achieved when using a phase-shift mask and chemically amplified resist.
Even on large plates more prone to distortion, the system can perform exposure across the entire substrate with uniform linewidths while correcting focus in real time. By controlling each lens in Nikon's multi-lens system according to substrate conditions and managing the operating environment within the system, the FX-6ASLH achieves overlay accuracy of ±0.18 µm or better. Nikon states this is the highest level among FPD lithography systems supporting G6 plates.
The company lists further specifications: projection magnification of 1:1, a takt time of 39 s/plate, and a light source described as UV-LED i-line equivalent. Takt time conditions are given as 1,500 mm × 1,850 mm, 4-scan, i-line equivalent and 30 mJ/cm2. Nikon says the high-intensity UV-LED light source enables both submicron resolution and high productivity.
Source: Nikon news
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