By AMT&C Group (Advanced Magnetic Technologies & Consulting Group)
System for thermal oxidation of VCSEL's functional layers STE APOX75 is intented for precision oxidation of functional layers during the formation of instrument structures based on A3B5 compounds. Key application is formation of aperture in the structures of vertically surface emitting lasers (VCSEL) as well as manufacturing of optical waveguides in photonic integrated circuits. System capacity - 1×Ø3” Temperature of heating system - from 100 ℃ to 500 ℃ Oxidation uniformity on wafer - ±1 μm Oxidized aperture measurement range (in-situ) - from 3 μm to 6 μm Key features - VCSEL's aperture forming - User-friendly interface
Materials: H2 Advantages: - Low energy consumption - Absence of high-energy particles and ions - Integrated water cooling Technical characteristics Thermocouple: Type C Bakeout temperature: 200°С Operating temperature: 2000°С In-vacuum length: 190-400 mm In-vacuum diameter: 36 mm Mounting flange: 40CF
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Materials: N2, H2, SiH4 ADVANTAGES: - PBN ionization chamber - Integrated matching device - Inductive plasma Technical characteristics - Input power: 50-400 W - In-vacuum length: 292 mm - Mounting flange: 63/100CF
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Counter-rotating vane set provides for linear control across the entire operating range of the valve. The precise setting of vane rotation of the plates is realized due to the servo-based flap control system.
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