By Nanonex
Ensuring reliable mold-resist separation Promoting adhesion between resists and substrates Easy handling and processing Stable properties after treatment
Full-wafer (up to 8") nanoimprinting tool All forms of nanoimprint and high resolution photolithography Patented Air Cushion Press TM (ACP) for ultimate nanoimprint uniformity Sub-micron overlay alignment accuracy and optical backside alignment (NX-2600BA) User friendly alignment scheme Smart Sample Holder for handling different sizes and irregular shapes Applications in opto, displays, biotechnologies, data storage, materials,..., etc
CATEGORY
Full-wafer (up to 12") nanoimprinting tool Patented Air Cushion Press TM (ACP) for ultimate nanoimprint uniformity All forms of nanoimprint: photo-curable, thermoplastic & embossing High throughput due to full-wafer impriting: sub-60 sec/wafer Optional alignment upgrade available Smart Sample Holder for handling different sizes and irregular shapes Applications in opto, displays, biotechnologies, data storage, materials,..., etc
CATEGORY
Full-wafer nanoimprinting tool All forms of nanoimprint: photo-curable, thermoplastic & embossing Patented Air Cushion Press TM (ACP) for ultimate nanoimprint uniformity High throughput due to full-wafer imprinting and minimized thermal mass Smart Sample Holder for handling different sizes and irregular shapes Applications in opto, displays, biotechnologies, data storage, materials,..., etc
CATEGORY
Step-and-repeat nanoimprinting tool Sub-micron alignment accuracy Enhanced Air Cushion Press (EACP) ensuring uniformity over entire substrate Photo-curable NIL, upgradable to thermal curable Integrated resist-drop dispensing system Sub-70 sec per imprint field Up to 8" SEMI standard wafers Applications in semiconductors, micro-wave, opto, displays, bio, data storage, materials,..., etc.
CATEGORY
