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Obducat Group
Safeguards a highly repeatable process result substrate-to-substrate as well as ensures the ability to maintain pattern fidelity which translates to higher yield levels…
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EV Group
With the invention of the world’s first double-sided alignment system in 1985, EV Group has revolutionized MEMS technology and set worldwide industry standards in aligned wafer bonding by separating the alignment and bonding process.
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NIL Technology
Perfect for testing & demos | Compact desktop size | Versatile and flexible | A cost-effective solution A desktop nanoimprint tool for easy replication of micro and nanoscale structures The starting point of nano-replication A compact nanoimprint tool that can be used for both imprinting and hot e
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Obducat Group
Semi-automated Nanoimprint Lithography R&D tools An easy-to-use semi-automated and affordable range of tools for substrate sizes up to 8” x 8”, allowing pattern replication on the micro- and nanometer scale. The EITRE® systems are particularly versatile because of the multiple imprint process capab
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Obducat Group
Semi-automated Tool “Semi-automated Nanoimprint Lithography Tool for Large Substrates” Nanoimprint tool for substrates up to 500 x 500 mm. This semi-automated tool enables high accuracy patterns with resolutions down to 50 nm to be replicated large substrates with excellent repeatability. The syste
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ASML
Our extreme ultraviolet (EUV) lithography systems provide the highest resolution in high-volume manufacturing. By enabling chipmakers to squeeze even more transistors onto a single chip, the state-of-the-art technology – which is unique to ASML – is pushing Moore’s Law forward.
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EV Group
UV- Nanoimprint Lithography System. A universal R&D mask alignment system with UV-nanoimprint capability from small pieces up to 150 mm.
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EV Group
SmartNIL® UV Nanoimprint Lithography System. A universal mask alignment system with UV-nanoimprint capability featuring EVG´s proprietary SmartNIL® technology up to 100 mm.
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EV Group
SmartNIL UV Nanoimprint Lithography System Mask alignment system with UV Nanoimprint capability featuring EVG´s proprietary SmartNIL® technology up to 150 mm Known for its automation flexibility and reliability, this system provides state-of-the-art mask alignment technology on a minimized footpri
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EV Group
Full-field UV Nanoimprint Lithography system up to 150 mm utilizing flexible stamps, featuring EVG´s proprietary SmartNIL® technology The EVG720 system leverages EVG's innovative SmartNIL technology enabling manufacturing of micro- and nanostructures with high pattern fidelity and low residual laye
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