By Nanoscribe
Empower your biomedical research with Quantum X bio, the high-resolution 3D bioprinter for tissue engineering, microfluidics and more. Enjoy unmatched freedom across a variety of substrates and biomaterials, from polymers to hydrogels. The Quantum X bio is a highly versatile, high-resolution 3D bioprinter powered by Two-Photon Polymerization (2PP). It enables the fabrication of detailed structures from subcellular to millimeter scale and supports sterile printing for biomedical research, tissue engineering, and microfluidics. Quantum X bio precisely prints organic designs and complex 3D structures into microfluidic chips and onto diverse substrates, using biomaterials from Nanoscribe, our partners or custom sources. Essential features like temperature and humidity control, a premixed air/CO₂ connection and HEPA-filtered airflow create a well-regulated environment, with the filtered airflow ensuring sterility. The high-resolution 3D bioprinter Quantum X bio is the optimal 3D biofabrication tool when resolution, precision, speed, biocompatible materials, and sterility are essential. Bioprinting library and smart workflow With Quantum X bio, you benefit from Nanoscribe’s intuitive software with touchscreen control, enabling easy print setup, execution, and monitoring — either directly on the device or remotely via nanoConnectX. The Bioprinting Model Library offers a growing selection of verified 3D designs to simplify your entry into high-resolution bioprinting. Continuous logging of temperature and humidity ensures cell-friendly conditions throughout the printing process. Included features - High-resolution bioprinting process with feature sizes down to ≤ 1 µm for subcellular structures based on Two-Photon Polymerization (2PP) - CO₂, temperature, and humidity control with heatable cell culture dishes enabled by Bioprinting Set - Access to the Bioprinting Model Library - Holders for a wide variety of substrates such as microscope slides and cell dishes Optional features - Rapid and accurate surface patterning enabled by Two-Photon Grayscale Lithography (2GL®) - Printing relative to fiducials/markers or chip edges, to support e.g. printing in microfluidic channels using Aligned 2-Photon Lithography (A2PL®) - Up to 60 times faster speeds at superior quality compared to classic 2PP, achieved through 3D printing by 2GL® (Two-Photon Grayscale Lithography) Benchmark scores Feature size control down to 100 nm in x/y direction Stitching-free part diameter up to 4,000 µm Maximum scan speed 6.25 m/s divided by lens magnification Live cell printing viability > 90% Given values may vary depending on the photoresin and structure geometry. General system properties Stage Positioning volume 150 x 150 x 20 mm³ Stage repeatability ≤ 150 nm Fully printable wafers: 2", 4", and 6" Manufacturable wafers: up to 8" Substrates Microscope slides / microfluidic chips (3” x 1” / 76 x 26 mm 2) Cell culture imaging dishes (35 mm or 50 mm) Various flat substrates up to a size of 100 x 100 mm 2 Glass, silicon, and further transparent/opaque materials, and coated/uncoated substrates Photoresins Nanoscribe photoresins (polymer printing) Nanoscribe GP-Silica (glass printing) Open for third-party or custom materials Hydrogel bioresins from Advanced BioMatrix and BIO INX
Achieve unparalleled performance in 3D microfabrication with this versatile, high-resolution 3D printer. Ideal for science and research labs, it covers multiple scales and applications, from MEMS to micromechanics and more. High-resolution 3D printer that covers multiple scales and applications. The Quantum X shape is a configurable high-resolution 3D printer based on Two-Photon Polymerization. It delivers optimal performance in rapid prototyping and wafer-scale batch production of complex 2.5D and 3D shapes across various scales with submicron precision and accuracy. Reshaping precision, output & usability: Quantum X shape offers outstanding versatility and flexibility for science and research applications. It covers multiple orders of magnitude – from nanometer-scale structures to centimeter-sized objects with high-volume throughput. It’s designed for research-driven environments such as universities, R&D centers, and multi-user labs. Operate your multiphoton lithography system via touchscreen or nanoConnectX across diverse materials and substrates. Benefit from industrial-grade precision, reliability and time-efficient wafer batch production. Achieve success in a wide range of applications, from micromechanics and MEMS to material engineering, micro-optics and life sciences, with our high-resolution 3D printer. Included features: - High-resolution 3D printing based on Two-Photon Polymerization for intricate nano-, micro-, meso- and macrostructures Optional features: - Rapid and accurate surface patterning enabled by Two-Photon Grayscale Lithography (2GL®) - Aligned 3D printing, e. g. high-precision optics aligned to fiber cores, chip surfaces and edges, or fiducials using Aligned 2-Photon Lithography (A2PL®) - Up to 60 times faster speeds at superior quality compared to classic 2PP, achieved through 3D printing by 2GL® (Two-Photon Grayscale Lithography) - Automatic dispenser for efficient batch-processing and wafer-level microfabrication - Automatic printing aligned to fiber cores enabled by the Fiber Printing Set - Automatic 3D mapping of complex substrate topographies enabled by Chip Printing Set with a confocal detection module - CO₂, temperature, and humidity control with heatable cell culture dishes enabled by Bioprinting Set Benchmark scores: - Surface roughness (Ra) down to ≤ 5 nm - Feature size control down to 100 nm in x/y direction - Shape accuracy (S a) down to ≤ 200 nm - Batch processing up to 200 typical mesoscale structures overnight - Stitching-free part diameter up to 4,000 µm - Maximum scan speed 6.25 m/s divided by lens magnification (Peak values, only achieved under specific conditions such as printing parameters, print heads, photoresins, and designs.) General system properties: - Stage Positioning volume 150 x 150 x 20 mm³ - Stage repeatability ≤ 150 nm - Fully printable wafers: 2", 4", and 6" - Manufacturable wafers: up to 8" - Substrates: Microscope slides (3” x 1” / 76 x 26 mm²); Wafers from 1” to 8” (25.4 mm to 200 mm); Various flat substrates up to a size of 100 x 100 mm²; Various glass bottom dishes; Glass, silicon, other transparent and opaque materials - Photoresins: Nanoscribe photoresins (polymer printing); Nanoscribe GP-Silica (glass printing); Open for third-party or custom materials Designed for flexibility with features that expand capabilities: This high-resolution 3D printer is part of the industry-proven Quantum X platform, the first 3D printing platform for 3D laser lithography that can process standard wafers ranging in size from 1” to 8”.
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Unlock scalable optics manufacturing with high-resolution 3D printing and automated alignment on fibers, chips, and wafers – enabling reliable, low-loss photonic coupling as well as sensing and imaging applications. Powered by the cutting-edge technology of 3D printing by 2GL®, Quantum X align produces freeform micro-optics with exceptional shape accuracy and surface quality. Dynamic voxel size control during the printing process significantly reduces the number of layers, thus boosting printing speed without compromising precision or quality. With Aligned 2-Photon Lithography A2PL®, Quantum X align automatically detects chip edges, fiber cores, fiducials on chip surfaces, on wafers, and on prestructured substrates. It then prints freeform micro-optics directly in place with nanometer-scale alignment accuracy, ensuring that the optics are printed aligned to optical axes. This makes the printer ideal for photonics packaging, saving time and costs for additional fabrication and assembly steps for mounting or fixation. Quantum X align delivers reliable results and is designed with smart automation features, easy-to-use software and streamlined workflows to accelerate 3D printing processes from prototyping to production. The system supports a broad range of validated resins for optics manufacturing. Nanoscribe photopolymers offer high transparency across the entire visible spectrum and into NIR and UV, different refractive indices and Abbe numbers. Designed for demanding applications, they offer proven stability under laser exposure, thermal stress, and humidity. Included features - Aligned 3D printing, e. g. high-precision optics aligned to fiber cores, chip surfaces and edges, or fiducials using Aligned 2-Photon Lithography (A2PL®) - Up to 60 times faster speeds at superior quality compared to classic 2PP, achieved through 3D printing by 2GL® (Two-Photon Grayscale Lithography) - 3D printing on different material platforms for photonics packaging, e.g. SiN, Si, SOI, GaAs, LNOI … - Automatic printing aligned to fiber cores enabled by the Fiber Printing Set - Automatic 3D mapping of complex substrate topographies enabled by the Chip Printing Set with a confocal detection module Optional features - Rapid and accurate surface patterning enabled by Two-Photon Grayscale Lithography (2GL®) Benchmark scores 3D alignment detection accuracy down to 100 nm in x/y direction Surface roughness Ra down to ≤ 5 nm Shape accuracy Sa down to ≤ 200 nm Feature size control down to 100 nm in x/y direction Typical processing time 10 min. for 8x lensed fiber array Achievable coupling losses down to ≤ 1 dB Peak values, only achieved under specific conditions such as printing parameters, print heads, photoresins, and designs. With confocal detection. Accuracy depends on selected print head. Best case for typical applications, depending on design, substrate quality and measurement method General system properties Stage Positioning volume 150 x 150 x 20 mm³ Stage repeatability ≤ 150 nm Fully printable wafers: 2", 4", and 6" Manufacturable wafers: up to 8" Substrates: Microchips, TO cans; Single cleaved fibers (single-/multimode/polarization-maintaining); Fibers in FC or SMA connectors; Fiber arrays (v-groove); Wafers from 1” to 8” (25.4 mm to 200 mm); Glass, silicon, other transparent and opaque materials Photoresins: Nanoscribe polymer photoresins; Open for third-party and custom materials
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Quantum X litho enables precise, versatile and aligned grayscale lithography for high-throughput 2.5D microfabrication – powering rapid prototyping, patterning, master template fabrication and wafer-scale production. Quantum X litho is a versatile grayscale lithography system offering superior design freedom and streamlined workflows – from fast job setup to high-performance printing and post-processing. It enables high-throughput 2.5D microfabrication for applications such as rapid prototyping, advanced patterning, master template fabrication, and wafer-scale production. Powered by Two-Photon Grayscale Lithography 2GL®, the system delivers high-precision freeform micro-optics, microlens arrays, Fresnel lenses, and hybrid optical components that combine diffractive and refractive features. Grayscale lithography for advanced designs Quantum X litho also supports patterning of complex microfluidic architectures and bioinspired topographies, including organic nano- and microstructured surfaces. The proprietary 2GL® technology combines high throughput with exceptional shape accuracy, enabling advanced 2.5D designs with tall features up to 1,000 µm, thus exceeding conventional height limitations. Top-tier industrial performance 2GL® accelerates innovation through rapid design iteration — enabling sub-day cycles from concept to printed part. Structures printed with Quantum X litho seamlessly integrate into industrial replication workflows such as nanoimprint lithography, hot embossing, and micro injection molding. Combined with nanoPrintX, the confocal detection module ensures precise alignment for wafer-level production. The optional 3D printing by 2GL® mode expands the system’s capabilities toward advanced 3D printing. Included features - Stunningly rapid and accurate 2.5D printing enabled by Two-Photon Grayscale Lithography (2GL®) - Wafer-scale production on transparent and opaque wafers Optional features - High-resolution 3D printing based on Two-Photon Polymerization (2PP) for intricate nano-, micro- and mesostructures - Up to 60 times faster speeds at superior quality compared to classic 2PP, achieved through 3D printing by 2GL® (Two-Photon Grayscale Lithography) - Aligned 3D printing on various substrates enabled by Aligned 2-Photon Lithography (A2PL®) - Automatic alignment to fiducials on wafers enabled by confocal detection module - Automatic printing aligned to fiber cores enabled by the Fiber Printing Set - Automatic dispenser for efficient batch processing and wafer-level production Benchmark scores Surface roughness (R a) down to ≤5 nm Feature size control down to 100 nm in x/y direction Shape accuracy (S a) down to ≤ 200 nm Stitching-free part diameter up to 1,750 µm Maximum scan speed 6.25 m/s divided by lens magnification Given peak values, only achieved under specific conditions such as printing parameters, print heads, photoresins and designs. General system properties Stage Positioning volume 150 x 150 x 20 mm³ Stage repeatability ≤ 150 nm Fully printable wafers: 2", 4", and 6" Manufacturable wafers: up to 8" Substrates Wafers from 1" to 8" (25.4 mm to 200 mm) Glass, silicon, and further transparent and opaque materials Photoresins Nanoscribe polymer photoresins Open to third-party or custom materials
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The first generation of high-resolution 3D printers is no longer available. Don't worry, its powerful successor, the Quantum X shape, is ready and waiting to meet your needs. Photonic Professional GT2 is no longer available. The Photonic Professional GT2 has been discontinued effective November 10, 2025. Introduced in 2008, this groundbreaking microfabrication platform has evolved through multiple product generations. It has won many prestigious awards and, most importantly, laid the foundation for thousands of innovations in science and research. The first groundbreaking system for scientific microfabrication based on Two-Photon Polymerization (2PP). Nanoscribe's Photonic Professional GT2 uses Two-Photon Polymerization (2PP) to produce filigree structures of nearly any 3D shape by high-precision 3D printing: crystal lattices, porous scaffolds, naturally inspired patterns, smooth contours, sharp edges, undercuts and bridges are all manufacturable with submicron resolution. More than a thousand successful research projects by Nanoscribe customers and system users are evidence of the power of two-photon lithography. Scientific performance. Photonic Professional GT2 combines flexibility based on versatility of use and design freedom with straightforward operation and a wide range of materials and substrates. Therefore, it is an ideal two-photon lithography instrument for science and rapid prototyping in multi-user facilities and research laboratories. Scientific solutions. For our Photonic Professional GT2 we have developed specific, process-centered solutions. This enhances the printing performance of the world's most field-proven high-precision 3D printer for the rapid fabrication of almost any shape on the nano-, micro- and mesoscale. Scientific community. Nanoscribe's 3D printers support cutting-edge research in over 30 countries. More than 1,800 pioneering research projects highlighted in peer-reviewed journal publications prove the powerful design and nanofabrication manufacturing capabilities of this versatile two-photon lithography system. Technical features in brief: High-speed 3D microfabrication with high precision and true design freedom; Straightforward workflow with open software architecture; Broad range of application-specific and universal printing materials; Open system for custom-made and third-party materials. Printing processes and range of scales: Two-Photon Polymerization (2PP)-based high-resolution 3D printing; Nanoscale printing – submicron feature size control in all spatial directions; Microscale printing – with typical dimensions from 50 to 700 micrometers; Mesoscale printing – for millimeter-sized print objects. Facts and figures on Photonic Professional GT2 - Key Features: High-speed 3D microfabrication using galvo technology; 3D design freedom with sub-micrometer feature sizes; Straightforward 3D printing workflow from CAD model import to printed product. Designed for: 3D Microfabrication Solutions Sets tailored to a variety of scales and applications; Broad range of print materials and substrates. Dynamic Precision Printing modes - Optimized balance between precision and speed. With our Dynamic Precision Printing modes (DPP ®), it's your decision. For speed and precision. All DPP modes are finely tuned starting points for quickly achieving excellent print results. With DeScribe, our print job preparation software, you can customize each mode to fit your design and specific requirements. The five DPP® modes in brief: Solid mode as the starting point for Dynamic Precision Printing stands for high precision, contour quality and shape accuracy. Shell/scaffold mode bypasses full-volume printing with inner support structures to increase print speed by a factor of 5 while maintaining the same high contour quality and shape accuracy. Pure shell is based on the shell/scaffold mode that stands for clean contours and thus increases printing speed by a factor of 7. Swift mode is the sprinter among the DPP modes and prints about 10 times faster, in a quality that is impressive and is functionally adequate for many purposes. Balanced swift mode enables 6 times the speed with significantly improved precision.
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