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Streak Camera
MetrologyInstrumentation

Streak Camera

By Attolight

A streak camera for cathodoluminescence (CL) analysis is a high-performance detector designed to capture ultra-fast changes in light emission over time. It is particularly suited for studying transient processes and carrier dynamics in materials, as it provides detailed insights into recombination rates, lifetimes, and other time-resolved properties of the material under investigation. With rise times measured below 20 picoseconds, it offers the best full-system resolution available, making it ideal for applications requiring precise temporal analysis. Key applications include: - Material Characterization: The streak camera enables in-depth analysis of carrier recombination and defect emissions in semiconductors, helping optimize materials for applications in LEDs and solar cells. - Nanophotonics: It supports the study of light-matter interactions at the nanoscale, which is essential for designing devices with enhanced light confinement and emission efficiency. - Photonic Device Development: By assessing optical gain, decay times, and light propagation, the streak camera aids in the advancement of photonic devices, including lasers and waveguides.

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In-SEM photoluminescence

This option harnesses the Attolight Allalin column’s unique design to directly inject a laser, creating a tightly-focused spot on the sample, provoking photoluminescence. Comparing photoluminescence with cathodoluminescence is of significant interest because photons and electrons have fundamentally different properties in terms of their interactions with matter. Performing both techniques together in-situ allows for direct comparison of the two types of luminescence without needing to account for differences in the spectroscopy setup. Attolight’s implementation of in-column photoluminescence features both CW and pulsed lasers, with a range of regular and time-resolved detectors to match. Mapping is made possible by using a specially-developed stage-scanning algorithm that takes advantage of the nm-precise piezo technology featured in the Allalin stage. Precise laser power and polarization control is also featured, together with functions automate power and polarization series.

Probe tip etching station

Option Robust and easy-to-use station to produce and design your own tips (< 10min)

6-inch Wafer stage

The wafer stage can accommodate wafers up to 6 inches in diameter at ambient temperature, allowing for full-wafer analysis without the need to cleave costly processed substrates. This capability enables comprehensive analysis of both substrate and deposit homogeneity across large areas, providing insights into uniformity and quality across the entire wafer. Additionally, limited automation is available via Python-based scripting, which allows users to streamline measurement processes and achieve more robust statistical analysis across multiple sites. This automation helps improve efficiency and ensures consistent, high-quality data collection.