By planarTECH
planarRIE-4B product specification CHAMBER UNIT •Chamber Body: SUS304 •Chamber Size: 270mm (OD) x 85mm (H) •60(OD)mm Electrode Port & KF25 Pumping Port •200(OD)mm Shoer Head Port and ¼” Gas Feeding Port •¼” Vent Port & 500(OD)mm View Port •Anodized Aluminum Door – Manually Operated SUBSTRATE UNIT •Max. Wafer Size: 4-inch Wafer •300W, 13.56MHz RF Generator with Auto Matching Network •SUS-based Anodized Aluminum Covered Electrode •Water-cooled, 6(OD)mm Flexible Hose • Plasma Shield Assembly &Teflon Insulator GAS SHOWERHEAD UNIT •SUS316 Door Embedded Type •¼” Gas Feeding Port & 2(OD)mm Gas Feeding Hole •¼” Purge Port for Venting Chamber VACUUM & PUMPING UNIT • 150 l/min Rotary Pump •CG202-N Vacuum Sensor • Flexible Exhaust Bellow • Optional: Automatic Pressure Control w/ Motorized Throttle Valve, Baratron Gauge & Controller • Optional: Dry Pump, Turbo-molecular Pump GAS SUPPLY UNIT •Three (3) Mass Flow Controllers o Argon (Ar) o Tetrafluoromethane (CF4) o Oxygen (O2) • One Open Mounting Bay for Additional MFC • ¼” Pneumatic Gas Valves • 4 Channel, GMC1200, MFC Controller ELECTRICAL CONTROL UNIT •PLC-based Control with 8.4” Touch-screen Display •Optional: Fully-automated PC Control o MS Windows 7 Pro Embedded PC o Intel Core2Duo E5700 3.0G o National Inst. LabVIEW User Front End o Samsung 19” LCD Monitor o Recipe Open/Save Function & Auto Process Mode • Safety Controls: Water and Air with Pressure Switch • Pneumatic Valve Control SYSTEM SIZE & UTILITY REQUIREMENT •Weight: approx. 150kg •System Dimensions: 700(W)x700(D)x600(H)mm • Power: 220V, Single-phase, 50A • Clean Dry Air: 5kgf/cm2, 6(OD)mm Connector • Water: 2-3kgf/cm2, 3/8” SUS 304 Pipe KEY BENEFITS •Self-contained benchtop unit requiring minimal space •13.56 MHz 300W RF generator with automatic matching network delivering excellent repeatability •8.4-inch touchscreen for ease of operation • Automatic pressure control with throttle valve available • Multiple choices of etching processes: o Chemical etching (isotropic, fast rate) o Reactive ion etching (anisotropic, medium rate) o Physical etching (anisotropic, slow rate)
planarRIE is an anisotropic plasma etching system that is designed to deliver optimum performance at low cost with high degree of process repeatability. It can handle wafers up to the size of 100mm (or 4 inches) in diameter. Depending on how it is configured, the system can be used for etching of oxides, nitrides, polymers, silicon, and III-V compounds. The system can accommodate a wide range of process gases. Standard are 3 mass flow controllers for precise control of gas flow rates with 1 more slot available for future expansion.
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Example of a Customized planarRIE-4C Full-sized System for Si and Polymer Etching (Installed at IIT-Kanpur, India)
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analytical systems that are useful in the study of these materials. Please click the images at right to view information about our Raman Spectroscopes
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The planarGROW series of thermal CVD systems for graphene (and CNT growth with minor modifications) is a horizontal hot-wall reactor system. We offer three standard system configurations (planarGROW-2B, planarGROW-4S, and planarGROW-6E) as shown in the table below. However, each of these standard systems can be customized to the user's specific application requirements. planarGROW-4S PRODUCT SPEC (GRAPHENE CONFIGURATION) QUARTZ TUBE & FURNACE - Tube Dimensions: ф1001200mm - Furnace Body (WxHxD): 500x500x350 - Heater: Kanthal Wire w/ Glass Wool Molding - Maximum Temperature: 1,100°C - Thermocouple: K type, ID 6.5 mm - Heating Zone: 1-zone, ф100350mm - Linear Motion Control Unit - Manual Furnace Door GAS SUPPLY UNIT - Three (3) Celerity TN2900 Mass Flow Controllers o Hydrogen (H2), 100sccm o Methane (CH4), 200sccm o Argon (Ar): 1,000sccm - Open Mounting Bay for Fourth (4th) MFC - ¼" Stainless Steel Tubing - Five (5) ¼" Pneumatic-Type Diaphragm Valves VACUUM & PRESSURE CONTROL UNIT - Atovac CG201 Convection Gauge - Atovac CG2000 Convection Gauge Controller - Atovac ACM200, 10 Torr Capacitance Manometer - Atovac ATV1000 Motor-Geared Throttle Valve - GPC3000 Pressure & Flow Controller - WSAutoma W2V40 Rotary Pump (400 liter/min) SYSTEM CONTROL UNIT - MS Windows XP Pro Embedded PC o Intel 3.0Ghz Core2Duo, 2GB Memory - PLC Module with National Inst. LabVIEW Interface - Samsung E1920R 19" LCD Monitor SAFETY & COOLING - Water Cooled End Flanges - Buzzer Alarm & System Error Display - Interlock System DIMENSIONS & UTILITY REQUIREMENTS - Footprint: 1.75m (W) x 1.60m (H) x 0.75m (D) - Weight: ~200kg - Power: 220V, 50/60Hz, 3Φ, 4-wire, 30A - Air: 4-5kgf/cm2, ¼" tube - Water: 2-3kgf/cm2, ½" tube One of the key benefits of the planarGROW product line is its ease of use via a fully functional Graphical User Interface (GUI) built around National Instruments LabVIEW software. This GUI allows full control of each system parameter, allows the user to load and save custom growth recipes, and enables "1-click" unattended operation via an auto process feature. The planarGROW-4S is equipped with a 4" (100mm) outer diameter primary quartz tube that can accommodate large sized Cu foils. During synthesis, however, planarTECH recommends using one or more smaller 1.5" or 2" outer diameter quartz tubes as carriers for the samples. This has two benefits: 1) Cu decoration will mainly affect these smaller tubes, prolonging the useful life of the primary quartz tube; and 2) it allows for growth of multiple samples in parallel. Even when using these smaller tube sizes, it is possible to grow samples on Cu foils up to 100x200mm. The figure below-left shows a typical operation cycle for graphene synthesis on a system with a standard Kanthal wire furnace. Fast run capability allows samples to be loaded at room temperature, processed and removed from the furnace after ~120 minutes. However, the actual time per run will be dependent on the recipe for graphene growth. (For example, growing large domain single crystals takes much more time than growing full coverage monolayer graphene with a smaller domain size. The default heater configuration of the planarGROW-4S is a moveable 1-zone furnace, which is controlled by the software interface. The software can be programmed such that after graphene synthesis has finished the furnace will be switched off and moved away from the samples to enable fast cooling operation as shown in the image below-right. With over 15 years of use for carbon nanotube (CNT) and graphene synthesis, the planarGROW product line has been used to synthesize the graphene with experimental results published in leading academic journals. Each planarGROW system is delivered with a standard warranty that covers all parts – excluding quartzware and O-rings – for one (1) year from the date of installation at the customer site. Any defects in materials or workmanship during the warranty period will remedied by repair or replacement free of charge. planarTECH ships each planarGROW system to the customer site by Incoterms CIP (Carriage & Insurance Paid) air freight direct from its factory in Korea. The cost of shipping is included in the base price.
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