By Ionautics
Capable of synchronizing all HiPIMS and bias units in the HiPSTER series for the ultimate HiPIMS experience. The HiPSTER synchronization unit allows the user to control the pulsing of up to eight HiPSTER HiPIMS powersupplies, compatible HiPSTER bias units, or compatible diagnostic hardware. This enables, for example, pulse trains synchronized between multiple units, or synchronized and delayed pulses. For increased flexibility, the HiPSTER synchronization unit can be triggered externally. FEATURES - Synchronized pulsing of up to eight units in the HiPSTER series - Pulse trains with a fixed number of pulses at a fixed frequency - Pulse trains synchronized between multiple units - Synchronized and delayed pulses repeated at a common frequency - Internal trigger available to synchronize other devices - Can be triggered externally from another device acting as Master APPLICATIONS - Multilayer deposition using more than one magnetron, where the user deposits a repeated sequence of layers with controlled layer thickness - Co-sputtering of compounds from more than one magnetron - Synchronized and delayed substrate bias for selective acceleration of ions, where different ionic species occur in the vicinity of the substrate at different points in time - Synchronized HiPIMS process diagnostics by triggering external diagnostic equipment
Our HiPSTER BiPolar HiPIMS units belong to a new generation of HiPIMS technology. They are designed by experts in the field with an excellent track record of plasma process development and thin film deposition in order to generate robust and repeatable HiPIMS processes. With the new ultra-fast switching technology and extended HiPIMS pulse control the HiPSTER BiPolar is a perfect tool when developing and running state-of-the-art HiPIMS processes. Also, upgrading your existing magnetron system to HiPIMS has never been easier. The HiPSTER BiPolar can be connected either to two existing DC power supplies (positive and negative output) or to our tailor-made HiPSTER DC units. FEATURES - Bipolar operation provides ion acceleration without the need of substrate biasing - Stable and robust discharge process (constant voltage and no unwanted oscillations) - Can be triggered externally (multiple power supplies) - New switching technology allowing HiPIMS pulsing frequencies up to 10 kHz - Tested using a wide range of magnetrons and processes (incl. reactive HiPIMS) - Add Ionautics' reactive process control for increased stability and higher deposition rate - Add Ionautics' superposition technology for HiPIMS + DC APPLICATIONS - Hard coatings: Smoother and denser elemental as well as reactively deposited compound coatings, which result in increased hardness, reduced corrosion, and less friction - Optical coatings: Increased optical properties through smoother interfaces and denser structures - Diffusion barriers: Better performance through increased coating density - Electrical coatings: Improved conductivity enabling reduced coating thickness and reduced heat load. Also increased isolation in the case of insulators can be obtained - 3-D coatings: Uniform film coverage on complex shaped substrates Top-quality products require top-quality components. In order to achieve an optimal result, we recommend using our tailormade HiPSTER DC units and our cables. Contact us for a package deal. Download data sheet here.
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Our new HiPSTER 25 is equipped with cutting-edge transistors made from SiC (Silicon Carbide), unlocking advanced operational modes for superior performance and efficiency. The HiPSTER BiPolar HiPIMS Units represent the next generation of HiPIMS technology. Expertly designed by leaders in plasma process development and thin-film deposition, these units deliver robust and repeatable HiPIMS processes. With ultra-fast switching technology and enhanced HiPIMS pulse control, the HiPSTER BiPolar series is the ideal solution for developing and executing state-of-the-art HiPIMS applications. FEATURES - Bipolar operation provides ion acceleration without the need of substrate biasing - Stable and robust process control using multiple process parameters - Can be triggered externally (multiple power supplies) - New switching technology allowing HiPIMS pulsing frequencies up to 150 kHz - Tested using a wide range of magnetrons and processes (incl. reactive HiPIMS) - Add Ionautics' reactive process control for increased stability and higher deposition rate APPLICATIONS - Hard coatings: Smoother and denser elemental as well as reactively deposited compound coatings, which result in increased hardness, reduced corrosion, and less friction - Optical coatings: Increased optical properties through smoother interfaces and denser structures - Diffusion barriers: Better performance through increased coating density - Electrical coatings: Improved conductivity enabling reduced coating thickness and reduced heat load. Also increased isolation in the case of insulators can be obtained - 3-D coatings: Uniform film coverage on complex shaped substrates Top-quality products require top-quality components. In order to achieve an optimal result, we recommend using our tailormade HiPSTER DC units and our cables. Contact us for a package deal. Download data sheet here. Contact us for more info
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The key to successful substrate biasing is to use a bias unit that can withstand the high ion flux to the substrate generated by the HiPIMS discharge and thereby maintain the desired bias voltage. Advantages of using our HiPSTER Bias solution is achieved by synchronizing the substrate bias to only the metal-ion-rich portion during the HiPIMS pulse. This is typically realized by slightly delaying the pulsed bias to suppress inert gas-ion bombardment in favor of predominantly metal-ions. The pulsed bias signal must be synchronized to the HiPIMS pulse using our HiPSTER Sync Unit. FEATURES - Pulsed bias operation for total control of ion acceleration to the substrate - Easy synchronization to one, or several, HiPIMS discharges with maintained bias voltage throughout the entire pulse - Wide bias voltage range that also allows substrate plasma etching prior to deposition - The possibility to separate metal ion- from gas ion-induced effects allows for low-temperature growth of single-phase metastable alloys with larger grain size, strong preferred orientation, high hardness, and low stress APPLICATIONS - Hard coatings: Smoother and denser elemental as well as reactively deposited compound coatings, which result in increased hardness, reduced corrosion, and less friction - Optical coatings: Increased optical properties through smoother interfaces and denser structures - Diffusion barriers: Better performance through increased coating density - Electrical coatings: Improved conductivity enabling reduced coating thickness and reduced heat load. Also increased isolation in the case of insulators can be obtained - 3-D coatings: Uniform film coverage on complex shaped substrates Top-quality products require top-quality components. In order to achieve an optimal result, we recommend using our tailormade HiPSTER DC units and our cables. Contact us for a package deal.
CATEGORY
Our HiPSTER HiPIMS units are designed by experts in the field with an excellent track record of plasma process development and thin film deposition in order to generate robust and repeatable HiPIMS processes. With the new ultra-fast switching technology and extended HiPIMS pulse control the HiPSTER is a perfect tool when developing and running state-of-the-art HiPIMS processes. Also, upgrading your existing magnetron system to HiPIMS has never been easier. The HiPSTER can be directly connected either to an existing DC supply or to one of our tailor-made HiPSTER DC units. FEATURES - Stable and robust discharge process (constant voltage and no unwanted oscillations) - Can be triggered externally (multiple power supplies) - New switching technology allowing HiPIMS pulsing frequencies up to 10 kHz - Tested using a wide range of magnetrons and processes (incl. reactive HiPIMS) - Real-time information on the discharge pulse voltage and current - Add Ionautics' superposition technology for HiPIMS + DC APPLICATIONS - Hard coatings: Smoother and denser elemental as well as reactively deposited compound coatings, which result in increased hardness, reduced corrosion, and less friction - Optical coatings: Increased optical properties through smoother interfaces and denser structures - Diffusion barriers: Better performance through increased coating density - Electrical coatings: Improved conductivity enabling reduced coating thickness and reduced heat load. Also increased isolation in the case of insulators can be obtained - 3-D coatings: Uniform film coverage on complex shaped substrates Top-quality products require top-quality components. In order to achieve an optimal result, we recommend using our tailormade HiPSTER DC units and our cables. Contact us for a package deal.
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