PDC-001 (115V) | PDC-002 (230V) | PDC-002-CE (230V, CE Certified) Our Expanded Plasma Cleaner is a larger benchtop plasma instrument and extensively used for nanoscale surface cleaning and surface activation. Features - Larger, benchtop unit - Adjustable RF power settings (Low, Medium, High) - Maximum RF power of 30W - Includes a 6″ diameter x 6.5″ length Pyrex chamber - Hinged door with viewing window - Active fan cooling - Integral switch for a vacuum pump - 1/8″ NPT metering valve to qualitatively control gas flow and chamber pressure - 1/8″ NPT 3-way valve to quickly switch from introducing gas, venting and isolating the chamber - Weight: 37 lbs - Size: 11″ H x 18″ W x 9″ D - Optional PlasmaFlo gas mixer allows quantitative control of up to two (2) process gases and monitoring of vacuum pressure - Optional quartz chamber and sample tray - Compatible vacuum pump available Requirements - Our Plasma Cleaners require a vacuum pump with a minimum pump speed of 1.4 m3/hr (23 L/min) and ultimate total pressure of 200 mTorr (0.27 mbar) or less - For pumping nonreactive gases (air, N2, Ar), see our Standard Vacuum Pumps. - For pumping concentrated or pure oxygen gas, see our Oxygen Service Pumps.
PDC-32G (115V) | PDC-32G-2 (230V, CE Certified) Our Basic Plasma Cleaner is a compact, inexpensive tabletop plasma instrument with a hinged door, viewing window, and fine control metering valve, suitable for nanoscale surface cleaning and activation of small samples. Features Compact, tabletop unit Adjustable RF power settings (Low, Medium, High) Maximum RF power of 18W Includes a 3″ diameter x 6.5″ length Pyrex chamber Hinged door with viewing window Active fan cooling Integral switch for a vacuum pump 1/8″ NPT metering valve to qualitatively control gas flow and chamber pressure 1/8″ NPT 3-way valve to quickly switch from introducing gas, venting, and isolating the chamber Weight: 13 lbs Size: 8.5″ H x 10″ W x 8″ D Optional PlasmaFlo gas mixer allows quantitative control of up to two (2) process gases and monitoring of vacuum pressure Optional quartz chamber and sample tray Compatible vacuum pump available Requirements Our Plasma Cleaners require a vacuum pump with a minimum pump speed of 1.4 m3/hr (23 L/min) and ultimate total pressure of 200 mTorr (0.27 mbar) or less For pumping nonreactive gases (air, N2, Ar), see our Standard Vacuum Pumps. For pumping concentrated or pure oxygen gas, see our Oxygen Service Pumps.
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PDC-001-HP(115V) | PDC-002-HP(230V) | PDC-002-HPCE(230V, CE Certified) With twice the cleaning rate as the Expanded Plasma Cleaner, the High Power Expanded Plasma Cleaner is a versatile instrument, suitable for etching organic thin films (10-100 nm) as well as surface cleaning and modification. Features Larger, benchtop unit Adjustable RF power settings (Low, Medium, High) Maximum RF power of 45W Low RF power setting is equivalent to High RF power setting on PDC-001/PDC-002 Includes a 6″ diameter x 6.5″ length Pyrex chamber Hinged door with viewing window Active fan cooling Integral switch for a vacuum pump 1/8″ NPT metering valve to qualitatively control gas flow and vacuum pressure 1/8″ NPT 3-way valve to quickly switch from bleeding in gas, isolating the chamber, and venting Weight: 37 lbs Size: 11″ H x 18″ W x 9″ D Optional PlasmaFlo gas mixer allows quantitative control of up to two (2) process gases and monitoring of chamber pressure Optional quartz chamber and sample tray Compatible vacuum pump available Requirements Our Plasma Cleaners require a vacuum pump with a minimum pump speed of 1.4 m3/hr (23 L/min) and ultimate total pressure of 200 mTorr (0.27 mbar) or less For pumping nonreactive gases (air, N2, Ar), see our Standard Vacuum Pumps. For pumping concentrated or pure oxygen gas, see our Oxygen Service Pumps.
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PDC-FMG(115V) | PDC-FMG-2(230V) The PlasmaFlo is an optional accessory that may be used with any of our plasma cleaners. The PlasmaFlo provides more precise, quantitative control of the gas flowrate and monitoring of vacuum pressure, both of which are beneficial for process consistency. A second gas source can also be added without having to manually swap gas line. Features Dual gas feeds for gas mixing or independent control of two process gases Dual process gas flowmeters 49 mL/min maximum flowrate for atmospheric air at 0 psig (Maximum flowrate varies with process gas and regulated pressure. Correlated flowrate tables are available for the most common process gases (Air, Ar, N2, O2) used with our Plasma Cleaners and metered at 10 psig. Flowrate tables for other process gases and regulated pressures can be made available. Please inquire.) ± 2% full scale accuracy Thermocouple vacuum gauge sensor connects to plasma cleaner door Digital meter displays pressure range of 1 mTorr to 760 Torr Weight: 7 lbs Size: 8.5" H x 10" W x 8" D
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