Laser nanoFab GmbH is delighted to announce the launch of our inaugural quantum technology product, a Rogers Ion Trap! This marks a significant milestone in our journey towards advancing quantum technology. This milestone wouldn't have been possible without the dedication of our incredible team and the invaluable support of our partners. We are eager to see the impact the Rogers Ion Trap will have on applications in both research and industry!
The EUV tube provided by Laser nanoFab GmbH is a compact and user-friendly extreme ultraviolet (EUV) source for metrology. The source is based on advanced microfocus X-ray tube technology that has been extended to the EUV spectral range. The EUV emission is generated by electrons colliding with solid state targets. This concept guarantees debris-free operation, well-defined performance characteristics and excellent long-term temporal and spatial stability. EUV POWER At present, EUV powers of up to 20 μW (2π sr, 2% bw) are achieved. STABILITY The EUV source has excellent long-term stability. In continuous operation the fluctuations were measured over a period of three days and typically less than 1%. SOURCE SIZE The source size is below 10 µm and can be varied via operation voltage and current. Source sizes of 100 μm and more are possible (full width at half-maximum). INTERFACE The EUV tube comes with a standard vacuum flange, so connection to your vacuum setup is easy. The EUV emission cone is centered on the flange axis. OPEN DESIGN Customer-specific adaptations are possible. APPLICATIONS - At-wavelength characterization of EUV optical components, e.g. multilayer mirrors, masks, or filters - Off-synchrotron calibration of EUV tools, e.g. spectrographs and energy monitors - EUV imaging and microscopy with high lateral resolution KEY FACTS - Compact set-up, easy and intuitive operation - Debris-free operation - Excellent long-term temporal and spatial stability - Very low running costs - Computer-controlled (start-up, centering, focusing, operation)
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Direct laser writing by two-photon polymerization (2PP) of photoresists is an emerging technique for the fast and flexible fabrication of fully three-dimensional (3D) structures with structure sizes down to less than 100 nm. The M4D micro- and nanostructuring system enables high-speed generation of 2D and 3D micro- and nanostructures over large areas and volumes. Applications - Microfludics - Biology - Medicine - Microoptics - Micromechanics - 3D Free-form structuring - 2D Surface structuring TECHNOLOGIES - Polymerization of photoresists with femtosecond laser - Submicrometer resolution with two-photon polymerization - Micro- and nanostructuring MATERIALIEN - Our optimized photoresists for 2PP: femtoBond ® - Standard photoresists for lithography - Biodegradable and biocompatible photoresists FAKTEN - Rapid Prototyping from Nanometer to Millimeter - Key technology for 3D nano rapid prototyping - For research and development PARAMETERS Resolution 100nm – 100µm Positioning Speed (typical) up to 50 mm/s Scanning Speed (typical) up tp 1 m/s Polymerization Volume (typical) 10cm x 10cm x 10cm Lasertypes Ultrashort Lasers System Open Design, customer specific modifications possible Footprint ca. 1 m² Configuration example femtosecond pump laser wavelength 1030nm pump laser power 10W pump laser rep. rate 1kHz to 1 MHz pump laser pulse duration 290 fs-10 ps second harmonic generator: laser output power 0.7 W pulse duration < 100 fs wavelength 515 nm repetition rate 75 MHz ± 1 linear axes air-bearing bidirectional repeatibility < ±0,075 µm speed (w/o load) (XY) 2m/s, (Z) 1m/s objective NA 0.5 2PP-structure height (Z) WOW-2PP prepared, structure height in Z only limited by the travel of the Z-axis software can be extended with own Visual Studio modules Other configurations are available.
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The EUV tube provided by Laser nanoFab GmbH is a compact and user-friendly extreme ultraviolet (EUV) source for metrology. The source is based on advanced microfocus X-ray tube technology that has been extended to the EUV spectral range. The EUV emission is generated by electrons colliding with solid state targets. This concept guarantees debris-free operation, well-defined performance characteristics and excellent long-term temporal and spatial stability. The characterization and quality control of multilayer mirrors, masks and optical components for the extreme ultraviolet lithography requires a compact, stable and debris-free light source. Laser nanoFab GmbH offers such a light source for metrology, which is based on the electron-induced characteristic emission of solid targets. Applications - At-wavelength characterization of EUV optical components, e.g. multilayer mirrors, masks, or filters - Off-synchrotron calibration of EUV tools, e.g. spectrographs and energy monitors - EUV imaging and microscopy with high lateral resolution
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femto Bond ® is our line of unique photoresists designed for 2D and 3D lithography techniques such as two-photon polymerization (2PP). femto Bond ® 4B...is our proven photoresist for use with near-infrared lasers e.g. around 800 nm. femto Bond ® 4C...is our proven photoresist for use with near-infrared lasers e.g. around 520 nm. Vorteile - Negative photoresist - Highest resolution - Easy handling - Robust processing - Very low shrinkage - Biocompatible - Transparent in polymerized state - True 2PP resist, hardly affected by daylight - Organic-inorganic hybrid material
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