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High temperature substrate heaters
DepositionInstrumentation

High temperature substrate heaters

By AMT&C Group (Advanced Magnetic Technologies & Consulting Group)

Patented design of substrate heaters for MBE systems provide stable operation and efficient heat distribution. Substrate uniform heating achieves due to adaptive construction to the temperature conditions. Technical characteristics - Diameter: By request - Heating element: PBN/PG/PBN

More from AMT&C Group (Advanced Magnetic Technologies & Consulting Group)

Atom-H source

Materials: H2 Advantages: - Low energy consumption - Absence of high-energy particles and ions - Integrated water cooling Technical characteristics Thermocouple: Type C Bakeout temperature: 200°С Operating temperature: 2000°С In-vacuum length: 190-400 mm In-vacuum diameter: 36 mm Mounting flange: 40CF

Plasma sources

Materials: N2, H2, SiH4 ADVANTAGES: - PBN ionization chamber - Integrated matching device - Inductive plasma Technical characteristics - Input power: 50-400 W - In-vacuum length: 292 mm - Mounting flange: 63/100CF

Throttle valve

Counter-rotating vane set provides for linear control across the entire operating range of the valve. The precise setting of vane rotation of the plates is realized due to the servo-based flap control system.

Gas sources

Materials: NH3, SiH4, CBr4 ADVANTAGES: - Integrated matching device - Ability to source heating Technical characteristics: - In-vacuum length: 292 mm - Mounting flange: 63/100CF