By Forge Nano
Fast, flexible, and field-upgradeable. Designed for rapid material discovery and pilot validation. 75mm to 200mm – Flexible substrate handling. Up to 100 Å/minute – Ultrafast deposition rates. Proprietary fast pneumatic valves – rated for 100 million
Powered by Forge Nano’s patented ALDˣ architecture, our systems deliver Atomic Armor™– ultra uniform, conformal coatings that stabilize interfaces and enable repeatable performance across complex wafer geometries. Designed for R&D through production, these systems provide the precision needed for dielectric layers, passivation layers, barrier seed layers, and next generation device architectures. Powered by Forge Nano’s proprietary ALDˣ technology, our systems deliver uncompromised surface engineering across complex wafer architectures. By integrating high-speed delivery with atomic-layer precision, we stabilize critical interfaces and eliminate the variability of other deposition techniques. From R&D to high-volume manufacturing, our ALDˣ process provides the hardened, repeatable control required to dominate next-generation semiconductor nodes.
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TEPHRA is dedicated to the manufacturing of specialty semiconductor applications on 200mm wafers and below. With 100x efficient chemical use, rapid cycle times, increased yield, and low-risk manufacturing, TEPHRA is the only single-wafer cluster tool with commercial throughput speeds. Forge Nano’s semiconductor wafer fabrication equipment applies ultra-thin, atomically precise coatings that unlock higher device performance, improved yield, and advanced material integration. Engineered for high-throughput production, these systems deliver conformal coatings at lower precursor consumption, reducing cost of ownership while enabling next-generation device architectures.
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American-made Li-ion cells, hardened at the atomic level. Proven Samsung SDI cells today. U.S. gigafactory production from 2028. No redesign. No new chemistry. Just hardened materials. We don’t change the chemistry; we harden it. ALDˣ stabilizes the interfaces where batteries fail — creating Atomic Armor™ at the material level. Unstable materials become controlled, durable systems ready for the field. Higher voltage tolerance. Longer mission life. Built for extreme conditions.
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Forge Nano’s powder ALD equipment enables precise, uniform coating of powders and granular materials at the atomic scale, transforming the performance of materials used in batteries, catalysts, pharmaceuticals, and advanced composites. By engineering surface properties without altering core material structure, it enhances conductivity, stability, and reactivity in ways traditional coating methods cannot achieve.
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