By Expertech
In addition to making fully new systems, Expertech also is a supplier of Remanufactured Thermal Processing Systems based on vertical furnace platforms. (For example, we remanufacture various OEM platforms). Expertech maintains an inventory of used systems available for rebuilding to custom customer requirements. For Vertical or Compact Remanufactured Systems, the units are: - stripped to the bare frame as needed which is then repaired and repainted - rebuilt from the frame up using 15% reused long life components (frame, panels, transformers) and 85% new components (new gas system, new electronics, etc.). During that process the system can be: - customized to the customer’s process requirements - enhanced with additional options added. The result is a system ready to meet processing demands at a significant cost saving over a fully new system. With over 34 years of experience, Expertech manufactures and refurbishes reactor systems. Designed for superior uniformity with proven production, our remanufactured systems provide high-performance capabilities for thermal processing operations.
Vertical thermal reactors from Expertech offer production-proven semiconductor diffusion processes. Providing a fully automated diffusion furnace solution with superior uniformity, the VTR7000PLUS has demonstrated world-class performance. VTR systems feature a unique dual-boat design for maximum operation and utilize premium components for reduced contamination in recipe-driven loading and processing technology. The VTR7000PLUS is a fully automated diffusion furnace that offers proven production superiority. Its design can achieve a higher throughput per tube using a dual-boat design, where one boat is in process while the other loads or reloads. Other high-quality features of Expertech's vertical diffusion furnaces include the following: - Features a ULPA-filtered Class 1 loading area and electropolished stainless steel surfaces for superior particle control - Uses a small-volume, ultraclean technology gas panel that is manufactured, tested, and capped in a cleanroom for fewer in-film defects - Easier and faster process tube maintenance through a mechanized tube removal system - Using a double-walled process tube to eliminate film particle formation near the loading door for advanced particle control in LPCVD films - Safety interlocks to protect personnel and equipment - Easy-to-learn operator interface with optional cell supervisor workstations for central monitoring and recipe control for a bank of up to 8 VTR systems Engineered with design enhancements for improved maintainability, high reliability, reduced contamination, and the smallest footprint in the industry, the VTR provides valuable cost savings through: - Low cost per wafer processed - Low cost to maintain - Low capital and installation cost VTR Reactor Performance - Flush mounted – no cleanroom projection - Width: 37 inches (95 cm) - Depth: 62 inches (1.57 m) - Height: 78 inches (1.98 m) in cleanroom wall - Height: 9 feet 8 inches (2.95 m) in service area - Service requirement: 4 feet (1.2 m) in rear - Up to 58 steps per recipe - Optional Host Supervisor system - Floppy drive / USB Port - SEMI Standard cassette type - Typical diffusion/oxidation: 150 product, test, and filler wafers. Exact load size process dependent. - Typical LPCVD: 150 product, test, and filler wafers. Exact load size process dependent. VTR System Operation - Standard Wafer Size: 150 mm and 200 mm - Optional Wafer Size: 100 mm and 125 mm - Low-Temperature Element of 250-600° C - Mid-Temperature Element of 500-1050° C - High-Temperature Element of 600-1200° C (Up to 1250° C for 4 Hours) - Uniformity: Flat zone, 22.5 in (57 cm) - Temp Control: ±0.5°C for Process Above 600° C - Class 1 Laminar Flow, Mirror-Finish 300 Series Stainless Steel Surfaces - ULPA Filter Tested to 99.9995% of Particles Greater Than 0.12 µm - Optional <100 PPM O2 Controlled Environment Available Process Models Available Atmospheric: - Wet/Dry Oxidation - Anneals - Forming Gas Anneals - Hydrogen Anneals - Phosphorus Predeoposition - POCl3 LPCVD: - Silicon Nitride (Dual Wall) - TEOS (Dual Wall) - Uniform Grain Polysilicon (Amorphous & Uniform Grain, N & P Doped) - HTO With over 1000 VTR systems currently in production use worldwide, it continues to maintain a global footprint for vertical furnace systems. This production proven semiconductor diffusion furnace design was originated by Silicon Valley Group (SVG) and is now a product line fully owned and supported by Expertech. A highly automated reactor with robust design features and a small footprint, Expertech's VTR system is one of the most well-known furnace designs worldwide. The VTR7000PLUS offers exceptional within-wafer and wafer-to-wafer uniformity in atmospheric and LPCVD processes. It is an ideal tool for advanced manufacturing, providing various benefits, including: - Manufacturing Versatility - Increased Automation & Throughput - Optimized Contamination Control - Reduced Cost-of-Ownership
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The CTR provides an exceptionally small footprint system and it is stackable. Providing both atmospheric pressure and LPCVD processes, the CTR is an ideal solution for pilot lines, R&D labs, and government and university laboratories.
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