CHA Industries is pleased to offer the Inficon HVPS-10KW as an alternative power supply for all your system, retrofit and replacement requirements. The HVPS is a solid state high voltage power supply with an integrated source controller used in electron beam (e-beam) vacuum deposition systems. Its revolutionary design makes it one of the smallest, most efficient, and feature packed high voltage power supplies on the market. Powerful Performance –HVPS has adjustable output voltage from 4 to 10.2 kV and adjustable emission current from 10 to 999 mA. This makes it compatible with a variety of electron beam guns. Zero voltage switching (ZVS) technology and near unity power factor help make the HVPS/SC over 90% efficient with less than 1% emission current ripple for a precise and reliable electron beam. CHA Industries has been utilizing the HVPS Power Supply for a number of years with great success both in new systems and retrofits. Please contact us with your electron beam power supply needs.
High Vacuum Deposition Systems In all SE/SEC-Series systems, the baseplate (typically 20 inches) accommodates up to 15 feedthroughs for instrumentation, control and rotary motion. SE/SEC-600 systems are most often equipped with a 19.5″ diameter bell jar and Planetary Fixturing having a capacity of 18 4″ wafers. The average pumpdown time of less than 30 minutes allows throughput in excess of 54 wafers per hour. Ultimate vacuum: 10 -8 torr range - Cryogenic pump: 8″ - Mechanical pump: 23-57 CFM, dual stage - Cold trap: 2.5 liter capacity, 200 sq. inches of surface area, 10 hours holding time - Water baffle: Optically dense, chevron baffle - High vacuum valve: 7-3/4″ I.D., seals vertically - Foreline/Roughing valves: 3″ I.D. - Valve actuation: Electro-pneumatic (all vacuum valves) - Valve sequencing: Manual and automatic (Auto-Tech II) - Ionization gauge control: Dual ionization gauge tube, auto ranging with dual convectron positions. - Dimensions: 79″H x 43″W x 37″D - Weight: 1,200 pounds - Utilities - Electrical: 208/10/70A/4-wire connection with ground (3 phase, 5-wire also available) - Water: 10 GPM (minimum) - Air: 90-110 PSIG Options: - Diffusion pump: 2400 liter/second, 6″ normal - Process chamber: 19.5″ diameter x 30″ H, ambient or water-cooled (larger bell jars available) - Fixturing: Variety of fixturing options: planetary, clamshell, or custom. - Baseplate: 20″ or 26″ diameter, 7-3/4″ pumping port - Substrate heat:2-10 kW - Sources: Any commercially available source, including single and multiple beam, CHA’s resistance and sputtering sources. - Hoists: Motorized hoist assembly, 1/4HP motor - LN2 Level Control: Automatically maintains liquid level in cryogenic trap. - Sieve trap: Molecular sieve trap prevents migration or backstreaming of mechanical pump oil into the system. - RGA port: 2.75 O.D. flange located in base plate of system provides integration of a residual gas analyzer. - Automatic deposition control: Process controller provides fully automatic deposition sequence. - Automatic gun rotation control: Positions the crucibles of a turret-type electron beam source. - Shutter/shutter control: Different design shutters can be incorporated depending on source configuration and number.
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The largest of the SE/SEC-Series, the SE-1000, is typically equipped with a 25.5″ diameter, water-cooled bell jar, a 26″ diameter stainless steel baseplate, and Planetary Fixturing holding up to thirty six 4″ wafers. One Button Automation and Lift-Off Fixturing are among the most popular options added to the system. Ultimate vacuum: 10-8 torr range - Ultimate vacuum: 10-8 torr range - Cryogenic pump: 10″ - Mechanical pump: 23-57 CFM, dual stage - Cold trap: 3.7 liter capacity, 250 sq. inches of surface area, 10 hours holding time - Water baffle: Optically dense, chevron baffle - High vacuum valve: 11-3/4″ I.D., seals vertically - Foreline/Roughing valves: 3″ I.D. - Valve actuation: Electro-pneumatic (all vacuum valves) - Valve sequencing: Manual and automatic (Auto-Tech II) - Ionization gauge control: Dual ionization gauge tube, auto ranging with dual convectron positions - Dimensions: 79″H x 43″W x 37″D - Weight: 1,500 pounds - Utilities: - Electrical: 208/30/70A/5-wire connection with ground - Water: 10 GPM (minimum) - Air: 90-110 PSIG Options: - Diffusion pump: 5300 liter/second, 10″ normal - Process chamber: 25.5″ diameter x 30″ H, ambient or water-cooled (32″ bell jar available) - Fixturing: Variety of fixturing options: planetary, clamshell, or custom - Baseplate: 26″ diameter, 11-3/4″ pumping port (32″ baseplate available) - Substrate heat: 2-10 kW - Sources: Any commercially available source, including single and multiple beam, CHA’s resistance and sputtering sources - Hoists: Motorized hoist assembly, 1/2HP motor - LN2 Level Control: Automatically maintains liquid level in cryogenic trap - Sieve trap: Molecular sieve trap prevents migration or backstreaming of mechanical pump oil into the system - RGA port: 2.75 O.D. flange located in base plate of system provides integration of a residual gas analyzer - Automatic deposition control: Process controller provides fully automatic deposition sequence - Automatic gun rotation control: Positions the crucibles of a turret-type electron beam source - Shutter/shutter control: Different design shutters can be incorporated depending on source configuration and number.
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High Vacuum Deposition Systems The SSC-1000 (10″) Sputtering System incorporates upper and lower base plates for sputter up or sputter down operation. Base plates move out of cabinet doors allow for through-the-wall mounting of the system. Specifications: - Accessibility: Substrates and stations are accessible from the top or bottom of the process chamber. Lower baseplate swings out for access through cabinet doors. Upper baseplate is elevated for substrate access and may be rotated outward for station access. - Up to four DC or RF round cathodes - Single plane, multi-substrate rotating fixture and a rotating shutter for pre-deposition and positive thickness cutoff control - 10-inch pumping stack components - Built-in electronics rack assembly located alongside the chamber access doors contains all system controls - Computer automation
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Restored by CHA to the highest level of performance and quality. No one knows CHA equipment like CHA. When you acquire a used Mark 50 or any CHA remanufactured system, you know that the company that originally built it is going to remanufacture it to the highest level of performance — with no compromise on quality. CHA provides some attractive options: a CHA Remanufactured System, or retrofitting your existing system to a complete rebuild of your existing CHA equipment. CHA’s Remanufactured Systems provide the high quality, high yield performance you’ve come to expect from the industry leader in thin film deposition systems, but at a much lower cost.
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