By Gencoa Ltd
Gencoa planar rectangular magnetrons combine low ownership cost, robust design and highly-optimized magnetics to produce a reliable product delivering high performance. Our rectangular magnetrons are in use in almost every type of industrial coating application including semiconductor, architectural glass and display coating. A unique design incorporating 'zero-height' anodes prevent short circuits during processes and reduce dust and defects in the coatings. All sources incorporate rear flange plate cooling as standard and additional anode water cooling is optional. Depending on the application, Gencoa can configure individual cathodes to meet specific process requirements and limitations. Key features - Robust with choice of optimized magnetics - RF standard electrical insulation - Two water inputs/outputs for enhanced flow and target cooling - Zero-height anodes to prevent shorts and arcing - Integral anodes with option of water cooling or zonal gas injection Magnetics High Yield (HY) range achieve 40% target utilization and are recommended for applications where increased machine up-time or reduced material costs are required. Metallizer (MZ) range is designed for high-rate metallizing of webs, car parts and decorative applications. Using specially-designed thick profiled targets and high water flows, the MZ range can increase the machine up-time by 100%. Vtech (VTER) range is dedicated to ion assisted deposition processes, where the degree of plasma impact on the growing film can be automatically varied by in-situ changing of the magnetic field. Ferromagnetic (HS) and (Loop) sputtering options for up to 6mm Nickel and 2mm Iron by (HS) magnetics or custom magnetic arrangement to suit ferromagnetic materials in Gencoa (Loop) magnetics. High Uniformity (HU) magnetics for optimised magnetic field uniformity for demanding applications. This is beyond Gencoa standard magnetic field scanning and QC and can provide magnetic field uniformities of better than 1% (TBC)
Optix is a multi-purpose instrument for rapid gas sensing in any vacuum environment, functioning through a wide range of operating pressures to cater for most industrial vacuum production processes without any requirement for a differential pumping system unless atmospheric sampling. Separated from chemicals by an optical window, Optix uses a remote plasma spectroscopy concept which generates a small plasma within the sensor head. A built-in spectrometer analyzes the plasma, automatically interpreting the light spectrum to provide quantitative measurement of the presence and concentration of gas within the vacuum. The Optix spectral information and sophisticated back-end software creates a range of uses for a wide range of applications, including contaminating processes involving hydrocarbons, solvents and long-chain polymers. Small changes are made to the device in the case of sensing CVD and ALD type processes in order to prevent contamination of the plasma head. Sensing from atmosphere is also possible with a small roughing pump to bring the gases into the sensor. Optix is very portable and easily switched between different vacuum systems or hand-carried in a small box to customer sites. It also offers an ultra-high sensitivity single gas option for dedicated leak detection. Applications/Processes - ALD - CVD - Etch - Heat treatment - Hipping - Leak detection - MOCVD - OLED - Plasma spraying - Process gas analysis - PVD Pressure regime advantages - Wide pressure range, operating directly at most process pressures - No need for expensive/complex differential pumps - No spurious readings from differential pump systems - No filaments and low maintenance - Chemically-tolerant with dedicated version for ALD and CVD processes - Automatic calibration of total pressure reading - Direct monitoring of the vacuum instantly register any changes (m/sec response) - Significantly less expensive than RGA and differential pump combination Interface An advanced Windows user interface provides clear visualisation of the condition of the process and vacuum, and powerful tools for recording and referencing data enable easy identification of process problems. Up to 20 gases can be monitored simultaneously, with process gas tracking that can be set up with trigger/alarm outputs. A full, tuneable spectrum view (200-850nm) provides control of integration time for sensitivity adjustments, and automatic gas peak detection works from a gas auto identification database which can be adjusted to incorporate additional peaks of specific interest. Software features - Built-in spectrum database for atomic and molecular emission signatures - Automatic spectrum interpretation - Time plots for automatically or user defined species - Customizable trigger set-up for end point detection or process control - Comprehensive data recording and data referencing capability - Vacuum quality tracker - Leak detection mode More information on the features included in the Optix software are detailed in the video presentation on Real time spectral plasma analysis software tools
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Gencoa's third generation range of small circular magnetrons are designed to operate under a low pressure range, and include ±45° tilt adjustment, gas injection and a rear utility box for DC, DC-pulsed, RF and HIPIMS processes as standard. Catering for applications ranging from R&D to small scale production, the 3G circular range of HV sources are available for target diameters of 2" to 5". With minimal use of polymer and newly-developed magnetics, the sources can perform in the 10-6 Torr range, delivering improvements to the deposition rate, reduced arcing, fewer impurities and a higher density coating. The sources can be assembled with a choice of magnetic and mechanical options, leading to performance benefits tailored to specific applications, and are built to reliably work with DC, RF, pulsed DC and HiPIMS power supplies. High yield (HY) magnetics can be fitted to sources with target diameters of 4-5”, delivering target usage of 40% for sputtering of precious metals. Key features - Low pressure sputtering (10-6 to 10-2 torr) - ± 45º tilt angle adjustment (1° accuracy) - Standard target sizes - High yield (HY) magnetics available for 4" and 5" target diameters, delivering 40% target usage - Internal gas injection as standard - Rear utility box as standard for RF and HIPIMS - Easy target change and choice of target thickness (1-6mm) - High strength magnetics for sputtering of magnetic material - Indirect or direct target cooling (pre-configured) Mechanical options All magnetrons in the 3G circular range are available for internal or external mount, with the following additional options: manual or pneumatic shutter, chimney, wallmount feedthrough, hidden/water-cooled anode. Dimensions The table below shows the different options of 3G circular magnetrons, along with each of the included mechanical options. Click on the PDF icons to download dimensional drawings for the required target size. - 3G: Internal, Tilt, Gas injection, Utility box; 2" sw50-3g.pdf, 3" sw75-3g.pdf, 4" sw100-3g.pdf - 3G-A: Internal, Gas injection, Utility box; 2" sw50-3g(A).pdf, 3" sw75-3g(A).pdf, 4" sw100-3g(A).pdf - 3G-B: Internal, Gas injection; 2" sw50-3g(B).pdf, 3" sw75-3g(B).pdf, 4" sw100-3g(B).pdf - 3G-C: Internal, Tilt, Gas injection; 2" sw50-3g(C).pdf, 3" sw75-3g(C).pdf, 4" sw100-3g(C).pdf - 3G-E: External, Gas injection; 2" sw50-3g(E).pdf, 3" sw75-3g(E).pdf, 4" sw100-3g(E).pdf
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The latest Optix technology features several key improvements to the design and performance. The power supply that drives the sensing plasma has been incorporated into the unit, enabling the Optix sensor to be more easily installed onto a system. This removes the external generator and associated power delivery and communication cables. Changes to the spectrometer have improved the sensitivity for gas species excited in the near infrared region of the spectrum, which impacts the detection of oxygen and argon. Oxygen is a important gas species for reactive sputtering and argon is emerging as an important alternative to helium for vacuum-based leak detection. Additionally, there is an option of a Higher Sensitivity (HS) spectrometer that can be fitted to improve gases detection by up to three times greater than the standard unit. This can be important at pressures nearer to atmosphere and processes that have high levels of background signals.
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Replicate the Speedflo user interface using a tool that provides a dynamic simulation of the Speedflo system. Benefitting from Gencoa’s in-depth understanding of process control, the software simulates the effect of Speedflo features such as controller gains and calibration parameters, in addition to system characteristics such as gas delivery pipe length. The simulator is a highly effective tool and can improve the system user's understanding of feedback control, as well as the operation of the Speedflo system.
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